Microdynamics and Nanodynamics: Materials, Structures and Devices

本研究的目标是开发制造微机电系统（MEMS）所需的材料工艺、光刻工艺和表征技术。本研究建立在先前研究的基础上，以扩展MEMS的CVD钨加工知识。本研究的重点将包括：(1)开发与当前硅和多晶硅技术兼容的钨和碳化硅多层薄膜工艺；(2)发展框架和桁架结构，实现类似框架宏观结构的高强重比结构；(3)探索利用电子束光刻和兼容工艺制造纳米机械结构；(4)开发时间分辨、高空间分辨电子束表征技术，以探测MEMS中的运动、电压分布、表面和体化学；(5)集成电路、控制算法和反馈系统的发展，以控制片上MEMS。

The goals of this research are to develop material processes, lithographic processes, and characterization techniques necessary for the fabrication of microelectromechanical systems (MEMS). This research builds on previous research to expand knowledge of CVD tungsten processing for MEMS. The focus of this research will include: (1) the development of tungsten and silicon carbide multilevel, thin film processes compatible with current silicon and polysilicon technology; (2) the development of frame and truss structures to achieve high strength-to-weight structures analogous to framed macroscopic structures; (3) exploration of the fabrication of nanomechanical structures using electron beam lithography and compatible processes; (4) the development of time- resolved, high spatial resolution electron beam characterization techniques to probe motion, voltage distributions, and surface and bulk chemistry in MEMS; and (5) the development of integrated circuits, control algorithms and feedback systems to control on-chip MEMS.