ENGINEERING EQUIPMENT GRANT: CONTACT MASK ALIGNER FOR BINARY DIFFRACTIVE OPTICS

这笔赠款是为了一个高分辨率 接触掩模对准器 制作二元相位衍射 光学元件 仪器 将大大扩展正在进行的 研究工作：1）提高 二元相的基本知识 光栅性能，2）应用它们 在光学互连系统中， 3)衍射设计与测试 磁光元件 数据存储头组件。 的 请求的掩模对准器将延伸 掩模对准分辨能力 至小于0.4微米，并且 使复杂的 上述所需的要素 应用. 成功 二元相微观演示 光学元件将有一个主要 对性能的影响， 这些系统的实现。 在 除了支持这些 具体研究项目， 设备将用于培训 学生制作二元相 光栅。 这将满足A 日益增长的教育需求 由几个合作的工业 政府实验室。

The grant is for a high resolution contact mask aligner for use in fabricating binary phase diffractive optical elements. the instrument will greatly expand the on-going research efforts to: 1) improve basic knowledge of binary phase grating performance, 2) apply them in optical interconnect systems, and 3) design and test diffractive elements for use in magneto-optic data storage head assemblies. The requested mask aligner will extend mask alignment resolution capability to less than 0.4 micrometers, and is necessary for making the complex elements needed for the above applications. Successful demonstration of binary phase micro- optical components will have a major impact on the performance and realization of these systems. In addition to supporting these specific research projects, the equipment will be used to train students to fabricate binary phase gratings. This would satisfy a growing educational need expressed by several collaborating industrial and government laboratories.