Presidential Young Investigators Award

总统青年研究员奖的重点是 宽禁带半导体材料的研究，如 金刚石、碳化硅和氮化硼。 用料 使用微波等离子体增强化学气相合成 沉积、氧乙炔火焰沉积和加热灯丝 证词 合成研究的重点是电影 表面形态和膜对基底的粘附性。 粘附 研究涉及表面表征和界面 通过离子束损伤和原位清洗进行改性。 表征技术包括俄歇光谱学、X射线衍射、 光电子能谱、紫外光电子能谱和 逆光电子能谱和电子衍射。

This Presidential Young Investigator Award concentrates on research on wide bandgap semiconductor materials, such as diamond, silicon carbide, and boron nitride. THe materials are being synthesized using microwave plasma enhanced chemical vapor deposition, oxyacetylene flame deposition, and heated filament deposition. The emphasis in the synthesis studies is film surface morphology and film adhesion to the substrate. Adhesion studies involve surface characterization and interface modification by ion beam damage and in-situ cleaning. Characterization techniques include Auger spectroscopy, x-ray photoelectron spectroscopy, ultraviolet photoemission and inverse photoemission spectroscopy, and electron diffraction.