A Compact Electron Injector for an X-Ray Lithography Ring

我们提出了一种减小用于蚀刻下一代高密度计算机芯片的紧凑型x射线光刻机尺寸的方法。一个由相对论速调管驱动的高梯度电子加速器取代了传统的直线加速器，作为超导同步辐射环的注入器，产生强烈的x射线。最近的实验结果表明，与传统直线加速器相比，电子可以在更短的高梯度加速器段内达到相同的最终能量。因此，所提议的机器比传统的x射线同步加速器要小得多。紧凑的机器使制造商能够利用高能、高强度的x射线在工厂环境中生产各种高密度的计算机芯片。在这项研究的第一阶段，我们将对注射系统进行概念性研究，并将考虑将相对论速调管高梯度加速器（RK/HGA）和超导同步辐射环（SSRR）结合成一台单一的x射线产生机的相关物理和工程问题。将特别考虑RK/HGA产生的极短脉冲与SSRR所需的大脉冲的兼容性，以保持电子束发射度。并权衡各种踢动磁铁配置的研究，以确保有效地将光束从RK/HGA转移到SSRR。

We have proposed a method to reduce the size of a compact x-ray lithography machine used for etching the next-generation high-density computer chips. A high gradient electron accelerator powered by a relativistic klystron is used in place of the conventional linac as an injector to a superconducting synchrotron radiation ring to produce intense x-rays. Recent experimental results have demonstrated that electrons can reach the same final energy in a much shorter section of the high gradient accelerator than the conventional linac. The proposed machine is therefore much smaller than the conventional x-ray synchrotron machines. The compact machine enables manufacturers to utilize high-energy, high-intensity x- rays to produce various high-density computer chips in a factory environment. In Phase I of this research, we will perform conceptual studies for the injection system, and will consider the related physics and engineering issues for combining the relativistic klystron high gradient accelerator (RK/HGA) and the superconducting synchrotron radiation ring (SSRR) into a single x-ray production machine. Particular consideration will be given to the compatibility of the extremely short pulses produced by the RK/HGA and the macropulses required by the SSRR, to the preservation of electron beam emittance, and to tradeoff studies of various kicker magnet configurations in order to ensure efficient transfer of the beam from the RK/HGA to the SSRR.