A High-Gradient Electron Injector for X-Ray Chip Lithography and Microfabrication
用于 X 射线芯片光刻和微加工的高梯度电子注入器
基本信息
- 批准号:9461156
- 负责人:
- 金额:$ 7.5万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:1995
- 资助国家:美国
- 起止时间:1995-01-01 至 1996-02-29
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
A method is proposed to enable full-energy injection in an x-ray lithography machine used for etching future high-density computer chips and microelectromechanical systems (MEMS). A high-gradient accelerator, which utilizes a high-power microwave source to drive electrons through a linear accelerating structure, can be used as a full-energy injector to an x-ray superconducting synchrotron radiation ring (SSRR), or to a granular e-beam driven x-ray source. Examples of microwave sources capable of producing the high power needed to drive the HGA are a relativistic klystron, a high-power X-band klystron combined with an rf pulse compression system, a sheet-beam klystron or a cluster klystron. Full-energy injection increases the stored current in the SSRR by eliminating energy ramp-up of electrons in the SSRR, a main source of current loss during injection. Higher stored current generates more intense x-rays, which in turn reduces the exposure time and increases the throughput, thus saving the unit cost of production. Development of the method and apparatus of an integrated system combining a full-energy HGA injector and the SSRR technologies is the main thrust of the present NSF SBIR project. Technical issues to be addressed in Phase I include continued R&D on the rf power source, feasibility of gridded gun modulation at the rf frequency of the ring, design of the septum and kicker magnets for high-energy injection, and optimization of the injection beamline layout in relation to the x-ray beamlines to minimize interference in a compact space.
提出了一种在用于蚀刻未来高密度计算机芯片和微电子机械系统(MEMS)的X射线光刻机中实现全能量注入的方法。高梯度加速器利用高功率微波源驱动电子通过线性加速结构,可用作X射线超导同步辐射环(SSRR)或粒状电子束驱动X射线源的全能量注入器。能够产生驱动HGA所需的高功率的微波源的例子有相对论速调管、结合射频脉冲压缩系统的高功率X波段速调管、片束速调管或集束速调管。全能量注入通过消除SSRR中电子的能量上升来增加SSRR中存储的电流,SSRR是注入过程中电流损失的主要来源。存储电流越大,产生的X射线越强,这反过来又减少了曝光时间,增加了产量,从而节省了单位生产成本。开发将全能量HGA喷射器和SSRR技术相结合的集成系统的方法和设备是目前NSF SBIR项目的主旨。第一阶段要解决的技术问题包括射频电源的持续研发、在环的射频下进行栅格化电子枪调制的可行性、用于高能注入的隔膜和Kicker磁铁的设计,以及与X射线光束线相关的注入光束线布局的优化,以最大限度地减少在紧凑空间中的干扰。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
数据更新时间:{{ journalArticles.updateTime }}
{{
item.title }}
{{ item.translation_title }}
- DOI:
{{ item.doi }} - 发表时间:
{{ item.publish_year }} - 期刊:
- 影响因子:{{ item.factor }}
- 作者:
{{ item.authors }} - 通讯作者:
{{ item.author }}
数据更新时间:{{ journalArticles.updateTime }}
{{ item.title }}
- 作者:
{{ item.author }}
数据更新时间:{{ monograph.updateTime }}
{{ item.title }}
- 作者:
{{ item.author }}
数据更新时间:{{ sciAawards.updateTime }}
{{ item.title }}
- 作者:
{{ item.author }}
数据更新时间:{{ conferencePapers.updateTime }}
{{ item.title }}
- 作者:
{{ item.author }}
数据更新时间:{{ patent.updateTime }}
David U. Yu其他文献
David U. Yu的其他文献
{{
item.title }}
{{ item.translation_title }}
- DOI:
{{ item.doi }} - 发表时间:
{{ item.publish_year }} - 期刊:
- 影响因子:{{ item.factor }}
- 作者:
{{ item.authors }} - 通讯作者:
{{ item.author }}
{{ truncateString('David U. Yu', 18)}}的其他基金
SBIR Phase I: Microfabrication of Planar Accelerating Structures for High-Frequency Electron Linear Accelerators
SBIR 第一阶段:高频电子线性加速器平面加速结构的微加工
- 批准号:
9661539 - 财政年份:1997
- 资助金额:
$ 7.5万 - 项目类别:
Standard Grant
SBIR PHASE II: A High-Energy Electron Injector for X-ray Chip Lithography and Microfabrication
SBIR PHASE II:用于 X 射线芯片光刻和微加工的高能电子注入器
- 批准号:
9529825 - 财政年份:1996
- 资助金额:
$ 7.5万 - 项目类别:
Standard Grant
A Compact Electron Injector for an X-Ray Lithography Ring
用于 X 射线光刻环的紧凑型电子注入器
- 批准号:
9060668 - 财政年份:1991
- 资助金额:
$ 7.5万 - 项目类别:
Standard Grant
相似国自然基金
Muon--electron转换过程的实验研究
- 批准号:11335009
- 批准年份:2013
- 资助金额:360.0 万元
- 项目类别:重点项目
相似海外基金
RII Track-4:NSF: Resistively-Detected Electron Spin Resonance in Multilayer Graphene
RII Track-4:NSF:多层石墨烯中电阻检测的电子自旋共振
- 批准号:
2327206 - 财政年份:2024
- 资助金额:
$ 7.5万 - 项目类别:
Standard Grant
Contorted and Strained Molecular Nanographenes: Multi-Electron Storage and Reduction-Induced Transformations
扭曲和应变的分子纳米石墨烯:多电子存储和还原诱导的转变
- 批准号:
2404031 - 财政年份:2024
- 资助金额:
$ 7.5万 - 项目类别:
Continuing Grant
CAREER: Photo-induced Ultrafast Electron-nuclear Dynamics in Molecules
职业:分子中光致超快电子核动力学
- 批准号:
2340570 - 财政年份:2024
- 资助金额:
$ 7.5万 - 项目类别:
Continuing Grant
Scanning Transmission Electron Microscope for Beam-Sensitive Materials
用于光束敏感材料的扫描透射电子显微镜
- 批准号:
LE240100063 - 财政年份:2024
- 资助金额:
$ 7.5万 - 项目类别:
Linkage Infrastructure, Equipment and Facilities
Field emission scanning electron microscope
场发射扫描电子显微镜
- 批准号:
532701230 - 财政年份:2024
- 资助金额:
$ 7.5万 - 项目类别:
Major Research Instrumentation
Intelligent cryo-electron microscopy of G protein-coupled receptors
G 蛋白偶联受体的智能冷冻电子显微镜
- 批准号:
23K23818 - 财政年份:2024
- 资助金额:
$ 7.5万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
Astroparticle Physics with a Trapped Electron
俘获电子的天体粒子物理学
- 批准号:
EP/Y036263/1 - 财政年份:2024
- 资助金额:
$ 7.5万 - 项目类别:
Research Grant
Atomistic reconstruction of large biomolecular systems from low-resolution cryo-electron microscopy data - RECKON
利用低分辨率冷冻电子显微镜数据原子重建大型生物分子系统 - RECKON
- 批准号:
EP/Y010221/1 - 财政年份:2024
- 资助金额:
$ 7.5万 - 项目类别:
Fellowship
Electron momentum spectroscopy of radiosensitizers New benchmark data for assessing the theoretical models
放射增敏剂的电子动量谱 用于评估理论模型的新基准数据
- 批准号:
EP/Y022297/1 - 财政年份:2024
- 资助金额:
$ 7.5万 - 项目类别:
Research Grant
CAS: Proton-Coupled Electron Transfer Reactions from Ligand-to-Metal Charge Transfer Excited States.
CAS:配体到金属电荷转移激发态的质子耦合电子转移反应。
- 批准号:
2400727 - 财政年份:2024
- 资助金额:
$ 7.5万 - 项目类别:
Standard Grant