A High-Gradient Electron Injector for X-Ray Chip Lithography and Microfabrication
A High-Gradient Electron Injector for X-Ray Chip Lithography and Microfabrication
批准号:
9461156
负责人:
David U. Yu
金额:
$7.5万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1995
资助国家:
美国
项目状态:
已结题
起止时间:
1995-01-01 至 1996-02-29
中文摘要
提出了一种在用于蚀刻未来高密度计算机芯片和微机电系统(MEMS)的X射线光刻机中实现全能量注入的方法。利用高功率微波源驱动电子通过直线加速结构的高梯度加速器可用作X射线超导同步辐射环(SSRR)或颗粒电子束驱动X射线源的全能量注入器。能够产生驱动HGA所需的高功率的微波源的例子是相对论速调管、与RF脉冲压缩系统组合的高功率X波段速调管、片束速调管或集束速调管。全能量注入通过消除SSRR中的电子的能量斜升来增加SSRR中的存储电流,这是注入期间电流损耗的主要来源。更高的存储电流产生更强的X射线,这反过来又减少了曝光时间并增加了产量,从而节省了单位生产成本。将全能量HGA注入器和SSRR技术相结合的集成系统的方法和装置的开发是当前NSF SBIR项目的主要推力。在第一阶段要解决的技术问题包括继续研发的射频电源,在环的射频频率的网格枪调制的可行性,设计的隔膜和冲击磁铁的高能量注入,和优化的注入束线布局相对于X射线束线,以尽量减少在紧凑的空间干扰。
英文摘要
A method is proposed to enable full-energy injection in an x-ray lithography machine used for etching future high-density computer chips and microelectromechanical systems (MEMS). A high-gradient accelerator, which utilizes a high-power microwave source to drive electrons through a linear accelerating structure, can be used as a full-energy injector to an x-ray superconducting synchrotron radiation ring (SSRR), or to a granular e-beam driven x-ray source. Examples of microwave sources capable of producing the high power needed to drive the HGA are a relativistic klystron, a high-power X-band klystron combined with an rf pulse compression system, a sheet-beam klystron or a cluster klystron. Full-energy injection increases the stored current in the SSRR by eliminating energy ramp-up of electrons in the SSRR, a main source of current loss during injection. Higher stored current generates more intense x-rays, which in turn reduces the exposure time and increases the throughput, thus saving the unit cost of production. Development of the method and apparatus of an integrated system combining a full-energy HGA injector and the SSRR technologies is the main thrust of the present NSF SBIR project. Technical issues to be addressed in Phase I include continued R&D on the rf power source, feasibility of gridded gun modulation at the rf frequency of the ring, design of the septum and kicker magnets for high-energy injection, and optimization of the injection beamline layout in relation to the x-ray beamlines to minimize interference in a compact space.
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会议论文
SBIR Phase I: Microfabrication of Planar Accelerating Structures for High-Frequency Electron Linear Accelerators
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批准号:9661539
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项目类别:Standard Grant
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资助金额:$7.5万
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财政年份:1997
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负责人:David U. Yu
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依托单位:
SBIR PHASE II: A High-Energy Electron Injector for X-ray Chip Lithography and Microfabrication
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批准号:9529825
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项目类别:Standard Grant
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资助金额:$29.08万
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财政年份:1996
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负责人:David U. Yu
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依托单位:
A Compact Electron Injector for an X-Ray Lithography Ring
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批准号:9060668
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项目类别:Standard Grant
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资助金额:$5.0万
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财政年份:1991
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负责人:David U. Yu
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依托单位:
国内基金
海外基金
Muon--electron转换过程的实验研究
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批准号:11335009
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项目类别:重点项目
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资助金额:360.0万元
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批准年份:2013
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负责人:李海波
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依托单位: