SBIR PHASE II: A High-Energy Electron Injector for X-ray Chip Lithography and Microfabrication

SBIR PHASE II：用于 X 射线芯片光刻和微加工的高能电子注入器

• 批准号: 9529825
• 负责人: David U. Yu
• 金额: $ 29.08万
• 依托单位: DULY Research Inc
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1996
• 资助国家: 美国
• 起止时间: 1996-10-01 至 1998-09-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9529825&HistoricalAwards=false
• 关键词: SBIR; PHASE; II; Energy; Electron

9529825 Yu This Small Business Innovation Research (SBIR) Phase II project explores a compact, high-gradient electron linear accelerator as an injector to a multiport, high-throughput, synchrotron X-ray radiation storage ring. The device will be used in X-ray lithography machines for manufacture of microelectronic chips and microelectromechanical systems (MEMS). Phase I produced a compact design for a full-energy injector that matches well to a superconducting storage ring X-ray source. A pulsed septum and kicker magnet were also designed for use with full-energy injection. Phase II will produce a detailed design of the X-ray source system and run simulation tests of high current stored and maintained in the compact ring using the new injection scheme. In concurrent Phase III development, under private-sector funding, a commercial prototype of a new full-energy, high-gradient injector will be built. By subcontract to Oxford Instruments of Carteret, NJ, Phase II will also modify a Helios 2 superconducting ring for full-energy injection. Potential commercial applications are expected in a new generation of high-throughput X-ray machines for lithography at feature sizes finer than 0.18 micron. This is expected to enable a major expansion in quality and productivity of the microelectronics industry. The new injection technology can also be adapted to MEMS microfabrication, which is also expected to grow significantly.

小行星9529825 这个小型企业创新研究（SBIR）第二阶段项目探索了一种紧凑的高梯度电子直线加速器，作为多端口，高通量，同步加速器X射线辐射存储环的注入器。 该器件将用于制造微电子芯片和微机电系统（MEMS）的X射线光刻机。 第一阶段产生了一个紧凑的设计，一个全能量注入器，匹配良好的超导存储环X射线源。 脉冲隔膜和冲击磁铁也被设计用于全能量注射。 第二阶段将对X射线源系统进行详细设计，并使用新的注入方案对紧凑环中储存和维持的高电流进行模拟测试。 在同时进行的第三阶段开发中，在私营部门的资助下，将建造一个新的全能量高梯度注入器的商业原型。 由新泽西州卡特雷特的牛津仪器公司开发的第二阶段还将修改Helios 2超导环，以实现全能量注入。 潜在的商业应用，预计在新一代的高吞吐量的X射线光刻机的特征尺寸小于0.18微米。 预计这将大大提高微电子工业的质量和生产率。 新的注射技术也可以适用于MEMS微加工，预计这也将显着增长。