课题基金 / 基金详情

Interinstitutional Fellowship Program

Interinstitutional Fellowship Program
机构间奖学金计划
批准号:
9116679
负责人:
Nino Masnari
金额:
$108.0万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1991
资助国家:
美国
项目状态:
已结题
起止时间:
1991-09-15 至 1998-07-31

项目摘要

项目成果

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中文摘要
翻译
北卡罗来纳州州立大学和北卡罗来纳州A T州立大学 大学正在联合建立NSF/AEMP机构间 研究金方案。 该计划的主要目标是 是增加攻读博士学位的非裔美国人的数量 在工程和资格的学术和研究事业。 第二个目标是为类似的项目建立一个模型 在其他大学。 简而言之,该计划将提供 为少数民族、妇女或 残疾学生,但最初的重点是非洲裔美国人 学生 该计划将提供全面的奖学金支持期间 第一,第二和第五年的博士研究(以下 理学士)和研究助理和补充研究金 在第三和第四年。 该计划还将提供 全额支付学杂费和支持基金 出版物编写、差旅和次要设备采购 研究员长达五年的研究。 重要组成部分 该计划的目的是使博士研究更具吸引力, 通过提供全面支持来加速学位的进展 在学生为研究做准备的时候, 然后,当学生写论文的时候。 期间 在研究阶段,学生将作为毕业生获得支持 研究助理,并辅以减少的研究金津贴。 这将使学生在这段时间内, 完成与研究相关的要求, 博士学位。
英文摘要
North Carolina State University and North Carolina A&T State University are jointly establishing the NSF/AEMP Interinstitutional Fellowship Program. The primary objective of the proposed program is to increase the number of African-Americans pursuing doctorates in engineering and qualifying for academic and research careers. A secondary objective is to establish a model for similar programs at other universities. In brief, the program will provide approximately eight full fellowships for minority, women, or disabled students, but focusing initially on African-American students. The program will provide full fellowship support during the first, second, and fifth years of doctoral study (following the BS) and research assistantships and supplementary fellowships during the third and fourth years. The program will also provide full payment of tuition and fees and funds in support of publication preparation, travel, and minor equipment purchases by fellows for up to five full years of study. Important components of the program are to make doctoral study more attractive and to accelerate progress toward the degree by providing full support during the time when a student is preparing for research and afterward, when the student is writing the dissertation. During the research phase the student would receive support as a graduate research assistant supplemented by a reduced fellowship stipend. This would allow the student, during this period, to concentrate fully on completing the research requirements associated with the PhD degree.
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会议论文
Ion Implantation in Ill-V Semiconductors
  • 批准号:
    8014647
  • 项目类别:
    Standard Grant
  • 资助金额:
    $3.9万
  • 财政年份:
    1980
  • 负责人:
    Nino Masnari
  • 依托单位:
Effect of Channel Doping and Gate Oxide Configuration on Mosfet Operation
海外基金