Extra Large Field Size Sub-Quarter Micron Lithography

POC提议开发一种全新的无透镜光刻机，使用微棱镜和波导全息图的组合，将产生低于0.25um分辨率的图像。这台机器将具有高分辨率，大场掩模，和最小的像差。第一阶段将进行理论和实验工作，以充分确定这种方法的局限性和设计集成电路应用的实用光刻机的可能性。技术问题包括材料要求，不同全息光学系统（HOS）的衍射极限，像差放大/退放大，噪声消除和功率分配和均匀性将被深入研究。基于POC专有的HOE制造技术，可以为该程序提供0.1um的图像分辨率的全息材料。

POC proposes to develop a totally new lensless lithography machine using a combination of microprisms and waveguide holograms which will produce images within a sub 0.25um resolution. This machine will have high resolution, large field masks, and minimum aberration. Both theoretical and experimental efforts will be made in Phase I to fully determine the limits of this approach and the possibility of designing a practical lithography machine for integrated circuit applications. Technical issues including material requirements, diffraction limits of different holographic optical systems (HOS), aberration magnification/demagnification, noise elimination and power distribution and uniformity will intensively studied. Holographic materials that can provide image resolution0.1um are available for this program based on POC's proprietary HOE fabrication techniques.