Fundamental and Applied Studies of Activated Nucleation and Growth of Thin Metal Films by Chemical Vapor Deposition

在这个项目中，由分析和表面 化学计划，教授努佐将进行一个 活性吸附和 有机金属CVD前体的分解。 早期 将探讨CVD金属化的各个阶段，重点是 有机铝试剂的反应化学 氧化和元素硅表面，以及 这些表面上的金属覆盖层。 分子束和 将结合表面光谱方法来探测 这些重要技术的详细机制 反应. 此外，还提出了一种直接求解 沉积图案化的金属膜将使用自显影技术来显影。 组装单层化学。 这项研究成果 项目将是非常有用的发展的理解 重要的电子材料加工化学。 %%% 金属薄膜沉积的初始阶段对 电子材料将在本研究项目中进行研究 在伊利诺伊大学的努佐实验室里， 尚潘。 详细研究了 用于化学气相沉积的有机金属前体 将进行金属层。 图案化薄膜沉积 也将探索使用自组装单层化学 在Nuzzo实验室开发的。

In this project, supported by the Analytical and Surface Chemistry Program, Professor Nuzzo will carry out a comprehensive study of the activated adsorption and decomposition of organometallic CVD precursors. The early stages of metallization in CVD will be explored, with emphasis on the reactive chemistry of organoaluminum reagents on oxidized and elemental silicon surfaces, and the nucleation of metal overlayers on these surfaces. Molecular beam and surface spectroscopic methods will be combined to probe the detailed mechanisms of these technologically important reactions. In addition, a generalized method for directly depositing patterned metal films will be developed using self assembled monolayer chemistry. The results of this research project will be very useful in developing an understanding of important electronic materials process chemistry. %%% The initial stages of metal thin film deposition on important electronic materials will be examined in this research project in the Nuzzo laboratory at the University of Illinois-Urbana Champaign. Detailed examination of the mechanism of organometallic precursors for chemical vapor deposition of metal layers will be carried out. Patterned film deposition will also be explored using self assembled monolayer chemistry developed in the Nuzzo laboratory.