Directed Chemical Deposition of Microstructures

这个研究化学气相沉积过程细节的三部分研究项目得到了分析和表面化学方案的支持。这项研究是在伊利诺伊大学厄巴纳香槟分校努佐教授的实验室进行的。利用溶胶-凝胶化学、图案化金属化和图案化催化聚合相结合的方法，开发了直接沉积亚微米结构的新方法。分子束沉积结合吸附中间体的表面光谱表征用于表征CVD生长过程的细节。自组装有机薄膜中的相行为构成了本项目第三部分的重点。本研究成果适用于发展中的纳米制造技术和电子器件制备技术。了解电子感兴趣材料薄膜的合成和生长细节是本研究项目的重点。自组装有机覆盖层、溶胶-凝胶化学和详细的化学气相沉积动力学研究相结合，为将新的薄层生长方法应用于材料微结构的制备提供了必要的知识基础。电子设备加工技术受到这项工作的影响。

This three part research project to study the details of chemical vapor deposition processes is supported in the Analytical and Surface Chemistry Program. It is carried out in the laboratory of Professor Nuzzo at the University of Illinois-Urbana Champaign. New methods are developed for the direct deposition of sub-micron structures, using a combination of sol-gel chemistry, patterned metallization, and patterned catalyzed polymerization. Molecular beam deposition coupled with surface spectroscopic characterization of adsorbed intermediates is used to characterize the details of the CVD growth process. Phase behavior in self assembled organic thin films forms the focus of the third part of this project. The results of this research are applicable to the developing technologies of nanoscale fabrication and electronic device preparation. Understanding the details of the synthesis and growth of thin films of electronically interesting materials is the focus of this research project. Self assembled organic overlayers, sol-gel chemistry, and detailed kinetic studies of chemical vapor deposition combine to provide the knowledge base essential to apply new thin layer growth methods to the preparation of material microstructures. Electronic device processing technologies are impacted by this work.