Catadioptric Lens for Excimer Laser Lithography

第二阶段的研究项目将包括一系列的想象测试，在248纳米的折反射透镜，使用薄涂层的深紫外线抗蚀剂，以获得最大的分辨率。 然后，我们将制造一个193 nm版本的透镜，并使用248 nm的相同标准进行测试。 与此同时，我们将制作一个步进重复成像平台，并将三运动（x，y，z）状态系统、观察光学系统、CRT显示器、透镜和传输光学系统集成在一起。 在使用imagine平台进行测试之前，我们将测试两种不同的匀浆器设计，选择最佳设计进行最终测试。 我们还将在关键光学表面上进行光学损伤阈值测试，以确定我们可以通过系统传递到晶圆衬底的最大能量。 最后，将传输光学器件与选定的均化器集成，完成成像平台;我们将在x、y和z载物台上方安装操作员观察光学器件，连接CRT监视器，并运行一系列193 nm最大分辨率和最大能量测试。 最先进的深紫外抗蚀剂将用于样品，并对整个光学系统的场分辨率、场均匀性和能量传输效率进行数据采集。 数据将产生的光刻性能的整个系统，以及光烧蚀反应的能力。 这些数据将确定该技术的商业应用潜力。 ***

The phase II Research Project will encompass a series of imagine tests at 248nm with the catadioptric lens, using thin coatings of deep-UV resists to obtain maximum resolution. We will then fabricate a 193nm version of the lens and test it with the same criteria used at 248nm. In parallel with this task we will fabricate a step-and-repeat imagine platform and integrate a 3- motion (x,y,z) state system, viewing optics, CRT monitor, lens and delivery optics. Prior to running tests with the imagine platform, we will test two different homogenizer designs, selecting the best one for final tests. We will also run an optics damage threshold test on the critical optical surfaces to determine the maximum energy we can deliver through the system to the wafer substrates. Finally, the integration of the delivery optics with the selected homogenizer will take place, completing the imaging platform; we will mount the operator viewing optics above the x, y, and z stages, connect a CRT monitor and run a series of 193nm maximum resolution and maximum energy tests. The most advanced deep-UV resists will be used for samples, and data taken on field resolution, field uniformity, and energy transmission efficiency of the complete optical train. Data will be generated on both the lithographic properties of the entire system, as well as the capabilities for photoablation reactions. This data will identify the potential of the technology for commercial applications. ***