NSF Young Investigator

9457758将研究用于微电子加工的化学反应气体等离子体。本研究的目的是了解工艺条件如何决定等离子体的性质、传输现象、气相和表面动力学，从而影响加工材料的性质。研究沿着两条线组织：开发和改进新的实验等离子体和表面诊断技术，提供表面和气相化学的基本信息；利用这些技术研究和操纵加工条件和工程设计，以生产具有理想性能的材料，如等离子体增强化学气相沉积。* * *

9457758 Aydil Chemically reactive gas plasma, used in microelectronics processing, will be studied. The objective of this research is to understand how the process conditions dictate the properties of the plasmas, the transport phenomena and gas phase and surface kinetics, which in turn affect the properties of the materials processed. The research is organized along two lines: developing and improving new experimental plasma and surface diagnostic techniques that give fundamental information on the surface and gas phase chemistry, and using these techniques to study and manipulate processing conditions and engineering designs in order to produce materials with desired properties in applications such as plasma-enhanced chemical vapor deposition. ***