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Theoretical and Simulational Modeling of the Deposition and Growth of Materials

Theoretical and Simulational Modeling of the Deposition and Growth of Materials
材料沉积和生长的理论和模拟建模
批准号:
9520842
负责人:
Fereydoon Family
金额:
$28.2万
依托单位:
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1995
资助国家:
美国
项目状态:
已结题
起止时间:
1995-08-01 至 1999-07-31

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中文摘要
翻译
该研究项目开发并应用新的理论和模拟建模技术来解决材料的生长、沉积和溅射问题。这些研究既包括生长的早期阶段,包括岛形核和亚单层结构中的缺陷,也包括在各种材料生长过程中,如分子束外延和离子束溅射和离子束溅射沉积,在长时间和长长度尺度下表面的演变和形态的研究。目前正在作出相当大的努力,继续查明和更好地了解在存在不同类型的增长不稳定的情况下远离平衡的过程。在这个项目中开发的概念和建模技术为我们提供了对各种材料生长过程的更深入的基本理解,这些过程具有重要的技术意义。本研究项目开发并应用新的理论和模拟建模技术来解决材料的生长、沉积和溅射问题。这些研究涉及生长的早期阶段,包括原子为单层厚的状态下的岛屿成核和缺陷,以及在各种材料生长过程中长时间和长长度尺度下表面的演变和形态的研究。目前正在作出相当大的努力,继续查明和更好地了解在存在不同类型的增长不稳定的情况下远离平衡的过程。在这个项目中开发的概念和建模技术为我们提供了对各种材料生长过程的更深入的基本理解,这些过程具有重要的技术意义。* * *
英文摘要
9520842 Family This research program develops and applies new theoretical and simulational modeling techniques to problems in the growth, deposition, and sputtering of materials. The studies involve both the early stages of growth, including nucleation of islands and defects in the submonolayer regime, as well as a study of the evolution and morphology of the surface at long times and long length scales in various materials growth processes, such as molecular-beam- epitaxy and ion-beam sputtering and ion-beam sputter deposition. Considerable effort is being made to continue to identify and better understand far-from-equilibrium processes in the presence of different types of growth instabilities. The concepts and the modeling techniques developed in this project provide us with a deeper fundamental understanding of a wide variety of materials growth processes that are of great technological importance. %%% This research program develops and applies new theoretical and simulational modeling techniques to problems in the growth, deposition, and sputtering of materials. The studies involve both the early stages of growth, including nucleation of islands and defects in the regime where the atoms are a single layer thick, as well as a study of the evolution and morphology of the surface at long times and long length scales in various materials growth processes. Considerable effort is being made to continue to identify and better understand far-from-equilibrium processes in the presence of different types of growth instabilities. The concepts and the modeling techniques developed in this project provide us with a deeper fundamental understanding of a wide variety of materials growth processes that are of great technological importance. ***
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Theoretical and Simulational Modeling of the Growth & Deposition of Materials
  • 批准号:
    9214308
  • 项目类别:
    Standard Grant
  • 资助金额:
    $25.5万
  • 财政年份:
    1992
  • 负责人:
    Fereydoon Family
  • 依托单位:
Development and Application of Direct Renormalization-Group and Monte-Carlo Techniques to Polymers (Materials Research)
  • 批准号:
    8208051
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $11.19万
  • 财政年份:
    1983
  • 负责人:
    Fereydoon Family
  • 依托单位:
海外基金