A Dual Pressure Discharge for Generation of Non-thermal Plasma at Atmospheric Pressure
A Dual Pressure Discharge for Generation of Non-thermal Plasma at Atmospheric Pressure
批准号:
9632384
负责人:
Shirshak Dhali
金额:
$19.76万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1996
资助国家:
美国
项目状态:
已结题
起止时间:
1996-09-01 至 2001-06-30
中文摘要
题目:常压下非热等离子体的双压放电研究摘要:本研究将研究一种在常压下空气中产生非热等离子体的新型放电方法。该设计由两个由紫外线透明电介质隔开的介质阻挡放电组成。紫外线光子使压力室预电离。由此产生的雪崩在高压区域产生扩散(汤森样)放电。紫外线照射是定时的,并有效地与大气压力放电耦合。这项研究的最终应用是空气污染控制。放电的电学特性(起始电压,功率,平均电流等)将被表征为这个目标。OH自由基的产生被认为是氧化应用中最重要的自由基,将在空气放电中使用激光诱导荧光进行研究;并将研究双压排放在燃煤烟气中通过氧化去除SO2的潜力。_________________________________________________________________
英文摘要
Proposal Number: ECS-9632384 Principal Investigator: Shirshak Dhali/Southern Illinois University at Carbondale Title: Dual pressure discharge for non-thermal plasma at atmosperic pressure Abstract In this research a novel discharge for the production of non-thermal plasmas in air at atmospheric pressures will be investigated. The design consists of two dielectric barrier discharges separated by a UV transparent dielectric. The UV photons pre-ionizes the pressure chamber. The resulting Avalanches in the high pressure region produce a diffused (Townsend-like) discharge. The UV irradiation is timed and efficiently coupled to the atmospheric pressure discharge. The eventual application of this research is in air pollution control. The electrical properties of the discharge (onset voltage, power, average current, etc.) will be characterized for this goal. The OH radical production, which is thought to be the most important radical for oxidation applications, will be investigated using laser induced fluorescence in an air discharge; and the dual pressure discharge will be investigated for its potential to remove SO2 by oxidation in a coal combustion flue gas. _________________________________________________________________
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会议论文
EAGER: Enhancement of Ammonia combustion by spatiotemporal control of plasma kinetics
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批准号:2337461
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项目类别:Standard Grant
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资助金额:$20.0万
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财政年份:2024
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负责人:Shirshak Dhali
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依托单位:
TSE: Use of Ambient Non-thermal Plasma in Manufacturing
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批准号:9985604
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项目类别:Continuing Grant
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资助金额:$24.0万
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财政年份:2000
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负责人:Shirshak Dhali
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依托单位:
Supercomputer Initiation: Computer Simulation of the Electrical Breakdown of Gases in Long Gaps
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批准号:8515163
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项目类别:Standard Grant
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资助金额:$0.0万
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财政年份:1985
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负责人:Shirshak Dhali
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依托单位:
海外基金