A study of the interactions between surfaces, neutral gas and the plasma in low-temperature discharges.

本研究的目标是提高对低温等离子体系统壁上发生的物理和化学过程的基本理解，并了解这些壁过程如何反馈到等离子体化学并影响辉光的基本特性。 实验和计算研究相结合，以解决这些问题。 等离子体的基本参数的测量是在一个修改后的气体电子会议（GEC）的参考电池，并与一个全面的等离子体设备模拟器，混合等离子体设备模型（HPEM）的结果进行比较。 重点是发生在室壁的过程及其对整体放电的影响。 所使用的诊断方法包括朗缪尔探针测量、微波干涉测量、傅里叶变换红外光谱（FTIR）、质量和能量分析、光学发射光谱（OES）和表面反射技术。工作气体和包含它们的壁之间的相互作用发生在所有地球低压等离子体中，例如用于半导体加工、照明和激光的等离子体。 这些相互作用可以确定辉光的基本参数，但很少有直接的研究。 这项工作将为等离子体室的设计、清洁或“调味”的合理方法提供基础。

The goals of this study are to improve fundamental understanding of the physical and chemical processes that occur on the walls of low-temperature plasma systems and to develop an understanding of how these wall processes feed back to the plasma chemistry and influence the basic properties of the glow. Experimental and computational investigations are combined to address these issues. Measurements of fundamental parameters of plasmas are made in a modified Gaseous Electronics Conference (GEC) reference cell and compared with results from a comprehensive plasma equipment simulator, the Hybrid Plasma Equipment Model (HPEM). The emphasis is on processes occurring on chamber walls and their influence on the overall discharge. Diagnostics used include Langmuir probe measurements, microwave interferometry, Fourier-transform infrared (FTIR) spectrometry, mass and energy analysis, optical emission spectrometry (OES), and surface reflection techniques.Interactions between working gases and the walls that contain them occur in all terrestrial low-pressure plasmas such as those used for semiconductor processing, lighting, and lasers. These interactions can determine the basic parameters of the glow, but have received little direct study. This work will provide a basis for a rational approach to the design, cleaning, or "seasoning" of plasma chambers.