NSF/DOE Partnership in Basic Plasma Science and Engineering: Laser-Triggered Multiple Hollow-Cathode Transient Plasmas for a Multi-Component Film Manufacturing Process

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This NSF/DOE Partnership in Basic Plasma Science and Engineering project addresses the development of a new process to generate highly ionized plasma plumes of metallic species for multi-component film growth. Multiple, laser-triggered hollow-cathode plasma sources are used for the deposition of stoichiometric multi-component films. The process affords precise control of the transient plasma dynamics and the plasma plumes can be made directional by external fields, thereby allowing the deposition of material on steps, facets or vias. The basic mechanisms involved in the formation, propagation and gas phase interactions of multiple transient metallic plasmas triggered by synchronized laser pulses is studied through Langmuir probe and in-situ optical diagnostics. These studies include the dynamics and plasma chemistry of multiple colliding plasmas as well as the effect of various plasma parameters on film stoichiometry, rate and area of growth, and the crystallinity and morphology of the films. A theoretical model is developed to simulate species propagation in a transient plasma plume. Applications that include the deposition of Cu, TiN and CuInSe2 films are used to illustrate the general feasibility of the proposed manufacturing process. This novel process will lead to high-throughput, high-quality, cost-effective, environmentally benign industrial applications in the fabrication of coatings and films.