Acquisition of a Plasma Science Research and Research Training Laboratory at UTD.
Acquisition of a Plasma Science Research and Research Training Laboratory at UTD.
批准号:
0079783
负责人:
Lawrence Overzet
金额:
$58.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2000
资助国家:
美国
项目状态:
已结题
起止时间:
2000-08-15 至 2003-07-31
中文摘要
摘要德克萨斯大学达拉斯分校工程与计算机科学学院、自然科学与数学学院的5位教职员工共同努力,建立了一个等离子体科学教学与研究实验室。实验室开发提供了五个不同的血浆站,每个系统都有相关的诊断。五个等离子体生成系统及其诊断为学生提供了多样化的研究培训体验。由于这些等离子体系统的选择是为了反映教师的研究兴趣,这个实验室也为pi提供了一个肥沃的研究环境。安装的设备如下:1]电感耦合等离子体(ICP)系统,带有残余气体分析仪、傅里叶变换红外(FTIR)光谱仪和吸收光谱(AS)系统;2]用于溅射沉积薄膜的直流/脉冲磁控管源与光学发射光谱(OES)和沉积膜分析;带微波干涉仪和朗缪尔探头的空心阴极放电源;4] dc/rf平行板等离子体源,配备FTIR光谱仪、沉积膜分析、Langmuir探针和电流-电压探头;5]具有OES, AS和电流-电压测量功能的各种灯。等离子体科学实验室在UTD为工程和自然科学专业的本科生(高级)和研究生提供研究培训能力。它包含了一个强大的教学组成部分,与当地行业的需求产生共鸣,并可能解决进一步转移行业的需求。毫无疑问,它也将用于培养非传统的学生。研究人员在半导体加工(蚀刻沉积和掺杂),照明等离子体和空间等离子体方面的广泛研究背景和兴趣使学生以及当地工业的技术和研究人员能够在不断扩大的等离子体科学和技术领域中学习基本的等离子体过程和诊断。此外,实验室亦加强五位合作研究人员的研究能力,并加强他们与学术界和工业界其他研究人员的团队合作。实验室拥有现代化的洁净室设施,因此设备既适合研究培训,也适合材料加工、器件制造和照明方面的高级研究项目。
英文摘要
CTS-0079783Lawrence J. OverzetUniversity of Texas at DallasMRI: Acquisition of a Plasma Science Research and Research Training LaboratoryAbstractThe acquisition and development of a plasma science teaching and research laboratory is a joint effort among 5 faculty members in the Schools of Engineering and Computer Science and Natural Science and Mathematics at the University of Texas at Dallas. The laboratory development provides five distinct plasma stations with related diagnostics on each system. The five plasma-generation systems and the diagnostics for them offer a diverse research-training experience for students. As these plasma systems were chosen to reflect the research interests of the faculty, this laboratory also provides a fertile research environment for the PIs. The facilities installed are the following: 1] an inductively coupled plasma (ICP) system with a residual gas analyzer, a Fourier Transform Infrared (FTIR) spectrometer, and an Absorption Spectroscopy (AS) system; 2] a dc/pulsed magnetron source for sputter deposition of films with optical emission spectroscopy (OES) and deposited film analysis; 3] a hollow cathode discharge source with a microwave interferometer and Langmuir probes; 4] a dc/rf parallel plate plasma source with an FTIR spectrometer, deposited film analysis, Langmuir probe and current-voltage probes; and 5] various lamps with OES, AS, and current-voltage measurement capabilities. The plasma science laboratory provides a research training capability at UTD for both undergraduate (upper level) and graduate students in Engineering and the Natural Sciences. It encompasses a strong teaching component, resonates with the needs of local industry, and can potentially address needs of further removed industry. It will undoubtedly be used to train non-traditional students as well. The extensive research backgrounds and interests of the investigators in semiconductor processing (etching deposition and doping), lighting plasmas, and space plasmas allow students, as well as technical and research staff from local industry, to learn about basic plasma processes and diagnostics in the expanding fields of plasma science and technology. The Laboratory also enhances the research capabilities and teaming of the five collaborating researchers along with other investigators in both academe and industry. The lab is housed in modern clean room facilities, and consequently the equipment is suitable for both research training and for advanced research programs in materials processing, device manufacturing, and lighting.
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