MRI: Acquisition of Electron-Beam Lithography for Nanofabrication in the North Texas Region
MRI: Acquisition of Electron-Beam Lithography for Nanofabrication in the North Texas Region
批准号:
1126224
负责人:
Lawrence Overzet
金额:
$70.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2011
资助国家:
美国
项目状态:
已结题
起止时间:
2011-09-01 至 2012-08-31
中文摘要
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英文摘要
Research Objectives and Approaches: The objective of this research is to enable the highest level nanoscale research within the entire north Texas region. The approach is to acquire a Raith e-LiNE Plus E-Beam Lithography (EBL) tool. It will be placed in the UTD Cleanroom Research Laboratory (CRL) to provide advanced lithographic capabilities. There is no EBL capability in north Texas to facilitate university and corporate research. Intellectual Merit: This EBL tool will accelerate existing research and enable new research avenues in an astonishing array of fields. Example areas enhanced include: Nanoscale Electronic Devices, Sensors, Manufacturing, Materials, and Photonics. Many researchers will be enabled by this EBL tool combined with the capabilities already resident in the CRL. The CRL has a large and growing user base (210) and the capability to make this EBL tool productive in the long term. UTD faculty and staff, together with colleagues throughout north Texas have the funding and expertise to make the most of this capability. Broader Impacts: The EBL acquisition will enhance a broad range of activities, people, research areas, and institutions. It will enhance research and education in the CRL including a variety of classes in multiple disciplines, both graduate and undergraduate (crucial to UTD?s teaching mission). In addition, it will enhance the training of high school students through summer research programs. All nanoscale research can be enhanced and it will foster new industrial collaborations. It will enable the researchers of numerous major universities and companies throughout north Texas and beyond.
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Student Travel Support for the 2008 Gaseous Electronics Conference (GEC)
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批准号:0838909
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项目类别:Standard Grant
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资助金额:$1.0万
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财政年份:2008
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负责人:Lawrence Overzet
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依托单位:
Acquisition of a Plasma Science Research and Research Training Laboratory at UTD.
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批准号:0079783
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项目类别:Standard Grant
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资助金额:$58.0万
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财政年份:2000
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负责人:Lawrence Overzet
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依托单位:
NYI: Pulsed Discharge Processing
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批准号:9257383
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项目类别:Continuing Grant
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资助金额:$33.75万
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财政年份:1992
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负责人:Lawrence Overzet
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依托单位:
Research Initiation: Negative Ion and Modulated Discharge Processing Studies (REU SUPPLEMENT)
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批准号:9009662
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项目类别:Standard Grant
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资助金额:$8.89万
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财政年份:1990
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负责人:Lawrence Overzet
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依托单位:
海外基金