Analytical, Fundamental and Instrumental Developments in Secondary Ion Mass Spectrometry (SIMS)

亚利桑那州立大学的Peter Williams博士和Richard Hervig博士提交的题为“二次离子质谱学的分析、基础和仪器发展”的研究项目得到了分析和表面化学计划的支持。该项目的目标是1)开发实时、定量分析氧对溅射离子产额影响的方法。2)溅射中性分析的基础研究。这将包括建立电离机制和研究污染问题。3)探索大规模团簇离子源实验，收集有关溅射产额和行为的信息。定量的实时测量是创新的，也是经过深思熟虑的。大规模的团簇撞击源实验具有挑战性，对半导体和生物表面的深度剖析非常感兴趣。这项研究具有潜在的社会影响，因为对浅层杂质含量和分布的定量计算可以显著改善微电子制造。基础研究对表面质谱分析领域具有重要意义。

The research project submitted by Dr. Peter Williams and Dr. Richard Hervig of Arizona State University entitled "Analytical, Fundamental and Instrumental Developments in Secondary Ion Mass Spectrometry (SIMS)" is supported by the Analytical and Surface Chemistry Program. The goals for the project are 1) to develop methods for real-time, quantitative analysis on the influence of oxygen on sputtered ion yields. 2) Fundamental studies in sputtered neutral analysis. This will include establishing mechanism of ionization and studying contamination problems. 3) To explore massive cluster ion source experiments for gathering information on sputtering yields and behavior. The quantitative, real-time measurements are innovative and well thought out. The massive cluster impact source experiments are challenging, and of great interest for the depth profiling of semiconductors and biological surfaces.There are potential societal impacts from this research because the quantitative calculation of impurity content and distribution at shallow depths could significantly improve microelectronics manufacture. The fundamental research is important to the field of surface mass spectrometric analysis.