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GOALI: Understanding Laser and Electron Beam Chemical Vapor Deposition Processes from Macro to Nanoscales

GOALI: Understanding Laser and Electron Beam Chemical Vapor Deposition Processes from Macro to Nanoscales
目标:了解从宏观到纳米尺度的激光和电子束化学气相沉积过程
批准号:
0300293
负责人:
W. Jack Lackey
金额:
$15.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2003
资助国家:
美国
项目状态:
已结题
起止时间:
2003-08-15 至 2007-01-31

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中文摘要
翻译
这项学术联络与工业(GOALI)项目的目标是建立一个电子束化学气相沉积系统,并确定其制造纳米级材料和器件的可行性。电子束与吸附在固体衬底表面的化学物质相互作用,引起化学反应,导致固体金属或陶瓷沉积在衬底上。通过相对于基板移动光束,可以制造三维结构和器件。由于电子束可以聚焦到1纳米左右的光斑尺寸,因此制造纳米级器件应该是可能的。目的是确定如何对市售电子显微镜进行改进,以开发可靠且通用的电子束化学气相沉积(EB-CVD)系统。在此设计任务之后,将采购并进一步修改设备以允许EB-CVD实验。这些实验将允许确定EB-CVD工艺在硅沉积和纳米级结构制造中的可行性。这些实验也将有助于理解电子束与吸附的化学物质相互作用形成金属和陶瓷沉积的机制。电子束沉积提供了一种真正适用于纳米级的新型节能制造技术。矿床成核和生长的现场检测将大大提高对这些现象的认识,这些现象对矿床几何形状和性质的控制至关重要。由于EB-CVD适用于广泛的金属和陶瓷,因此该研究将影响当前和未来器件,传感器和结构等领域的关键材料的合成,如电子/光子学,MEMS,纳米技术和高温材料。与工业合作伙伴的互动将允许开发适合研究和制造的商业EB-CVD系统。该系统将在佐治亚理工学院建立,将促进本科生和研究生的培训,包括代表性不足的群体。
英文摘要
The objective of this Grant Opportunities for Academic Liaison with Industry (GOALI) project is to build an electron beam chemical vapor deposition system and determine its feasibility for the fabrication of nanoscale materials and devices. An electron beam has been shown to interact with chemicals that are adsorbed onto the surface of a solid substrate causing a chemical reaction(s) that leads to the deposition of a solid metal or ceramic onto the substrate. By moving the beam relative to the substrate, 3-D structures and devices can be fabricated. Since electron beams can be focused to spot sizes on the order of 1 nm, it should be possible to fabricate nanoscale devices. The aim will be to determine how a commercially available electron microscope could be modified in order to develop a reliable, yet versatile, electron beam chemical vapor deposition (EB-CVD) system. Following this design task, the equipment will be procured and further modified to permit EB-CVD experiments. The experiments will permit determining the feasibility of the proposed EB-CVD process for the deposition of silicon and for the fabrication of nanoscale structures. The experiments will also permit developing an understanding of the mechanisms by which the electron beam interacts with the adsorbed chemical(s) to form metal and ceramic deposits.Deposition with an electron beam offers a new energy efficient manufacturing technique truly applicable at the nano-level. In-situ examination of deposit nucleation and growth will greatly enhance the understanding of these phenomena which are critical to control of deposit geometry and properties. Since EB-CVD is applicable to a wide range of metals and ceramics, the research will impact synthesis of critical materials for current and future devices, sensors, and structures in areas as diverse as electronics/photonics, MEMS, nanotechnology, and high temperature materials. Interaction with industrial partners will permit development of a commercial EB-CVD system that is appropriate for both research and manufacturing. The system to be built at Georgia Tech will facilitate training of undergraduate and graduate students, including underrepresented groups.
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NIRT: Electron Beam Chemical Vapor Deposition (CVD) - A New Tool for Manufacturing Nanomaterials and Devices
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