GOALI: Laser-Jet Chemical Vapor Deposition (CVD) Rapid Prototyping of Electronic Devices and Laminated Materials

GOALI：电子设备和层压材料的激光喷射化学气相沉积 (CVD) 快速原型制作

• 批准号: 0070429
• 负责人: W. Jack Lackey
• 金额: $ 37.49万
• 依托单位: Georgia Tech Research Corporation
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2000
• 资助国家: 美国
• 起止时间: 2000-08-15 至 2004-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0070429&HistoricalAwards=false
• 关键词: GOALI; Laser; Jet; Chemical; Vapor

The goal of the research is to identify process-structure-property relationships and conduct process planning in order to permit efficient operation of the newly developed laser-jet chemical vapor deposition (LCVD) rapid prototyping (RP) system and demonstrate the usefulness of this system by fabricating advanced electronic devices and structural materials. The LCVD-RP system, which began operation in August 1999, was specifically designed by this research team to permit rapid prototyping and manufacture of complex shaped, 3-D, composite electronic/photonic devices and structural material components. Visualize a laser and gas jet positioned above a substrate whose movement is computer-controlled. At any instant, the laser heats a spot on the substrate, which is simultaneously flooded by a localized jet of CVD reagent gases. Only the spot heated by the laser becomes coated as a result of the thermally activated CVD reaction. The combination of laser CVD with gas jets offers significant advantages in terms of facilitating the deposition of multiple materials, maximizing deposition rate, and conserving reagent. Prior research has focused on producing simple structures such as fiber arrays and solenoids because the process control utilized was not sophisticated. The LCVD-RP system utilizes hardware, computer control, and on-line dimensional equipment that will permit growth of intricate, useful composite devices and components. The LCVD-RP system possesses the following novel features: (1) three modes of operation, two of which utilize a high velocity gas jet that increases the deposition rate, (2) a rotating/translating stage that facilitates rapid movement of the stage relative to the laser and/or gas-jet, (3) an on-line dimensional control system, and (4) on-line temperature monitoring and control. The system enables fabrication of novel devices and material microstructures that are impossible to fabricate by conventional methods. For example, the research will demonstrate the fabrication of an advanced electron beam source, and either a g-sensor or fiber-reinforced nanolaminate composite materials.

研究的目标是确定工艺-结构-性能的关系，并进行工艺规划，以允许新开发的激光喷射化学气相沉积（LCVD）快速成型（RP）系统的有效操作，并通过制造先进的电子器件和结构材料证明该系统的实用性。 LCVD-RP系统于1999年8月开始运行，由该研究团队专门设计，用于快速成型和制造复杂形状的3D复合电子/光子器件和结构材料组件。 将激光和气体喷射定位在计算机控制移动的基底上方。 在任何时刻，激光器加热衬底上的一个点，该点同时被CVD试剂气体的局部射流淹没。 由于热激活CVD反应，只有被激光加热的点被涂覆。 激光CVD与气体喷射的组合在促进多种材料的沉积、最大化沉积速率和节省试剂方面提供了显著的优势。 以前的研究集中在生产简单的结构，如光纤阵列和光纤，因为所使用的过程控制并不复杂。 LCVD-RP系统利用硬件、计算机控制和在线尺寸设备，这些设备将允许复杂的、有用的复合材料器件和组件的生长。 LCVD-RP系统具有以下新颖特征：（1）三种操作模式，其中两种使用高速气体射流以增加沉积速率，（2）旋转/平移台，其促进台相对于激光器和/或气体射流的快速移动，（3）在线尺寸控制系统，以及（4）在线温度监测和控制。 该系统能够制造传统方法无法制造的新型器件和材料微结构。 例如，该研究将展示先进电子束源的制造，以及g传感器或纤维增强纳米层压复合材料。