SBIR Phase I: Microscale Interferometric Sensor for High Speed MEMS Metrology

这个SBIR第一阶段项目研究了一种创新的微机械光学干涉仪作为MEMS生产质量控制工具的科学和技术可行性。无论是作为一种使能技术，还是作为一个新市场，MEMS发展的障碍之一都是质量控制。质量控制不仅提供质量保证，还提供反馈，以优化所涉及的设计、制造和组装过程。本文提出的静电驱动的微型位置传感光栅干涉仪(UPSGI)本身就是微细加工的，并与光电子学集成。它以高分辨率(亚纳米)和高带宽(MHz)测量MEMS的位移。在本项目中，将制作一种具有可移动光栅的uPSGI，并将其集成到显微镜物镜中。干涉仪的性能将在动态MEMS器件上进行测试，并将评估并行阵列操作的可行性。提出的技术利用专利技术将大规模干涉计量系统转换为微型传感器。它可以为MEMS制造商的特定需求量身定做，以降低制造成本、交货期和材料浪费，并提高产品可靠性。潜在客户包括所有的MEMS制造公司。

This SBIR Phase I project investigate the scientific and technical feasibility of an innovative micromachined optical interferometer as a quality control tool for MEMS production. One of the barriers to the growth of MEMS both as an enabling technology and as a new market is quality control. Quality control not only provides quality assurance but also it provides feedback to optimize the design, fabrication and assembly processes involved. The proposed microscale position sensing grating interferometer (uPSGI) with electrostatically actuated grating is itself microfabricated and integrated with optoelectronics. It measures the displacement of MEMS with high resolution (sub-nm) and bandwidth ( MHz). In this project, a uPSGI with movable grating will be fabricated and integrated into a microscope objective. The performance of the interferometric will be tested on dynamic MEMS devices and the feasibility of parallel array operation will be evaluated. The proposed technology converts the large-scale interferometric metrology system to a miniature sensor using a patented technology. It can be tailored for specific needs of MEMS manufacturers to reduce manufacturing costs, lead-time and waste of material and to increase product reliability. Potential customers include all the MEMS manufacturing companies.