Exploring the Influence of Deposition Conditions on the Microstructure and Growth Kinetics of Nitrogen Doped Carbonaceous Thin Films

在分析和表面化学计划的支持下，约翰霍普金斯大学的费尔兄弟教授和他的同事们正在研究氢化非晶氮化碳薄膜的生长动力学和形貌。由甲基自由基源、氢离子源和氮离子源组成的模型等离子体反应器被用来控制生长这些薄膜。X射线光电子能谱、红外光谱和原子力显微镜对薄膜的表征与薄膜生长参数和由此产生的生长动力学有关。这些薄膜作为硬涂层在磁盘驱动器和光学行业中有着广泛的应用，对它们的增长的基本了解可能会影响这些行业以及整个薄膜的增长。本实验室对研究人员进行多学科教育的结果就是这些研究。约翰斯·霍普金斯大学费尔布鲁克教授的实验室进行的这项研究的目标是从根本上了解薄膜生长动力学和形态与生长等离子体组成的相关性。薄膜表征与受控生长条件相结合，提供了有关生长机制和动力学的信息。这些信息对设计生产摩擦学和光学薄膜和涂层的工艺很有用。

AbstractCHE-0616873Fairbrother/Johns HopkinsWith the support of the Analytical and Surface Chemistry Program, Professor Fairbrother and his colleagues at the Johns Hopkins University are studying the kinetics and morphology of the growth of hydrogenated amorphous carbon nitride films. A model plasma reactor, consisting of a methyl radical source and hydrogen and nitrogen ion sources, is used to controllably grow these films. Characterization of the films by X-ray photoelectron spectroscopy, infrared spectroscopy, and atomic force microscopy is correlated with film growth parameters and the resulting growth kinetics. These films have broad application as hard coatings in the disk drive and optics industries, and a fundamental understanding of their growth may impact these industries as well as thin film growth in general. Multidisciplinary education of researchers in this laboratory results from these studies. A fundamental understanding of the dependence of film growth kinetics and morphology related to the composition of growth plasmas is the goal of this research being carried out in the laboratory of Professor Fairbrother at the Johns Hopkins University. Film characterization coupled with controlled growth conditions provides information about the mechanisms and kinetics of growth. This information is useful in the design of processes for the production of tribological and optical films and coatings.