SBIR Phase I: Nanoporous Nano-laminated Ultra Low-K Dielectric

这个小型企业创新研究第一阶段项目将展示生产具有纳米孔和纳米层压结构的低k电介质的可行性。该项目将展示沉积低k多孔二氧化硅和氟硅酸盐堆叠的可行性，使用常压热等离子体处理纳米二氧化硅粉末来生产薄膜前驱体。低k介电材料的成功开发将使集成电路继续进化以获得更高的性能。开发的沉积技术将允许同时支持卓越的薄膜性能和非常高的生产能力的工艺。

This Small Business Innovation research Phase I project will demonstrate the feasibility of producing low k dielectrics with a nanoporous and nanolaminated structure. The project will demonstrate the feasibility of deposition of low-k porous silica and flourosilicate stacks, using atmospheric-pressure thermal plasma treatment of nanoscale silica powders to produce the film precursors.Successful development of low k dielectrics will enable continued evolution of integrated circuits for higher performance. The deposition technology developed will permit processes that support both superior film performance and very high throughput.