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Self-Controlled Surface-Selective Atomic Layer Deposition for Integrated Vertical Nanowire Field Effect Transistors

Self-Controlled Surface-Selective Atomic Layer Deposition for Integrated Vertical Nanowire Field Effect Transistors
用于集成垂直纳米线场效应晶体管的自控表面选择性原子层沉积
批准号:
0926245
负责人:
Xudong Wang
金额:
$15.9万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2009
资助国家:
美国
项目状态:
已结题
起止时间:
2009-09-01 至 2012-08-31

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中文摘要
翻译
这项研究的目的是获得基本的了解如何气体表面钝化分子与纳米线阵列的原子层沉积系统。具体而言,该目标将通过以下方式实现:(1)理解钝化分子如何在具有不同密度的ZnO纳米线之间扩散;(2)确定所选钝化前体相对于前体的粘附系数的钝化能力;(3)将表面选择精度与前体的反应性相关联。此外,集成垂直NW FET将被制造,其特征在于优化沉积条件,以获得最佳介电层质量和器件性能。该项目的最终成果预计将实现一个?聪明吗薄膜沉积技术,可以?自我选择?沉积区。这项研究将为大规模集成半导体纳米线到三维纳米电子系统提供一种通用、简单和低成本的制造技术。在这项研究中建立的理解将铺平道路的一种新的技术,选择性功能化纳米线表面在大规模的气相沉积方法。研究发现将纳入PI?关于纳米材料和纳米技术。这项研究将为培养研究生和本科生提供一个极好的机会,在纳米科学的前沿制造和表征技术。本研究建立的先进原子层沉积设备和技术将与PI共享。的同事,以加强先进材料和纳米技术的研究和教育的基础设施。将在PI之间建立伙伴关系?的小组和K-12学校的教师和学生通过这项研究计划。
英文摘要
The objective of this proposed research is to gain fundamental understanding of how gaseous surface passivation molecules interact with nanowire arrays in an atomic layer deposition system. Specifically, the goal will be accomplished by: (1) understanding how the passivation molecules diffuse among ZnO nanowires with different densities; (2) determining the passivation ability of the chosen passivation precursor with respect to the sticking coefficient of the precursors; (3) correlating the surface selective accuracy to the reactivity of the precursors. In addition, integrated vertical NW FETs will be fabricated characterized to optimize the deposition condition for the best dielectric layer quality and device performance. The final outcome of this project is expected to realize a ?smart? thin film deposition technique that can ?self-choosing? deposition area. This research would lead to a general, simple and low-cost fabrication technique for large-scale integrating semiconductor nanowires into three dimensional nanoelectronic systems. Understandings established in this research would pave the path to a novel technique for selectively functionalizing nanowire surfaces in large scale by vapor deposition methods. The research discovery will be integrated in the PI?s graduate course about Nanomaterials and Nanotechnology. This research will provide an excellent opportunity for training graduate and undergraduate students with fabrication and characterization technologies in the frontier of nanoscience. The advanced atomic layer deposition facility and techniques established in this research will be shared with PI?s colleagues to enhance the infrastructure for advanced materials and nanotechnology research and education. A partnership will be established between the PI?s group and K-12 school teachers and students through this research program.
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