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Exploration of Multidirectional 3-D UV Lithography for Advanced Microfabrication

Exploration of Multidirectional 3-D UV Lithography for Advanced Microfabrication
先进微加工多向 3D 紫外光刻技术的探索
批准号:
1128806
负责人:
Yong-Kyu Yoon
金额:
$6.98万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2010
资助国家:
美国
项目状态:
已结题
起止时间:
2010-08-01 至 2012-08-31

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中文摘要
翻译
本研究的目的是:(1)研究计算机控制的多方向三维紫外光刻技术在先进微加工中的能力和应用;(2)从工艺参数建立最终产品的预测模型。首席研究员开发了一种包含计算机控制的具有倾斜和旋转功能的动态舞台的紫外光刻工艺。该方法将用于精确的三维微加工,以产生倾斜,旋转和组合图案高达一或两毫米的高度。由于该工艺采用亚微米波长的光源,其空间分辨率将小至1微米或更小。考虑折射和衍射效应、光化学反应和活动平台的动态控制等因素,采用射线追踪模拟的方法对制备过程进行了分析,并建立了预测结构模型。作为试验载体,将展示微流体点胶系统和先进的气举式螺旋天线阵列。该项目的成功结果将对生物医学、微流体、射频、微电子和光学研究领域先进的芯片实验室类型系统的实施产生重大影响。紫外光刻固有的批量加工能力提供了大规模生产和可制造性。此外,低廉的系统和制造成本使其在一般实验室使用时几乎没有预算限制。在教育方面,开发的技术将在研究生实验课程和在线课程中传播。在线教育方式有望促进工程教育的全球化。此外,重点放在招收少数民族和暑期拓展项目为大三学生从当地地区。
英文摘要
The objectives of this research are (1) to investigate the capability and application of computer-controlled multidirectional three-dimensional ultraviolet-lithography for advanced microfabrication, and (2) to establish a predictive model for the final products from process parameters. The principal investigator has developed an ultraviolet-lithography process incorporating a computer-controlled dynamic stage with tilting and rotational functionalities. The method will be utilized in precise three-dimensional microfabrication to generate slanted, revolving, and combinational patterns up to one or two millimeter height. Since the process employs a submicrometer wavelength light source, its spatial resolution would be as small as one micrometer or less. The fabrication process will be analyzed and a predictive structural model constructed with ray tracing simulation, taking into account refraction and diffraction effects, photochemical reaction, and the dynamic control of the movable stage. As test vehicles, a microfluidic dispensing system and an advanced air-lifted spiral antenna array will be demonstrated. Successful outcome of the project will significantly impact implementation of advanced lab-on-a-chip type systems in areas of biomedical, microfluidic, radio frequency, microelectronic, and optical research. The inherent batch processing capability of ultraviolet-lithography offers mass productivity and manufacturability. Moreover, the inexpensive system and fabrication cost affords its general laboratory usage with little budgetary constraints. On the educational front, the developed technology will be disseminated in a graduate laboratory course and an on-line course. The on-line educational approach is expected to facilitate globalization in engineering education. Additionally, an emphasis is placed on recruiting minorities and summer outreach programs for junior students from the local area.
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NSF Convergence Accelerator Track I: Energy-efficient MetaConductors for Convergence of Sustainable Electronics (E-MC2 of Sustainable Electronics)
  • 批准号:
    2235978
  • 项目类别:
    Standard Grant
  • 资助金额:
    $75.0万
  • 财政年份:
    2022
  • 负责人:
    Yong-Kyu Yoon
  • 依托单位:
SenSE: Smart Electropalatography for Linguistic and Medical Applications (SELMA)
  • 批准号:
    2037266
  • 项目类别:
    Standard Grant
  • 资助金额:
    $75.0万
  • 财政年份:
    2020
  • 负责人:
    Yong-Kyu Yoon
  • 依托单位:
CAREER: RF/Microwave components and devices using micro-/nano machined metamaterial
  • 批准号:
    1132413
  • 项目类别:
    Standard Grant
  • 资助金额:
    $22.24万
  • 财政年份:
    2010
  • 负责人:
    Yong-Kyu Yoon
  • 依托单位:
CAREER: RF/Microwave components and devices using micro-/nano machined metamaterial
  • 批准号:
    0748153
  • 项目类别:
    Standard Grant
  • 资助金额:
    $40.0万
  • 财政年份:
    2008
  • 负责人:
    Yong-Kyu Yoon
  • 依托单位:
海外基金