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Templated Self-Assembly for Nanomanufacturing

Templated Self-Assembly for Nanomanufacturing
用于纳米制造的模板化自组装
批准号:
1234169
负责人:
Karl Berggren
金额:
$40.5万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2012
资助国家:
美国
项目状态:
已结题
起止时间:
2012-09-15 至 2015-08-31

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中文摘要
翻译
在这个项目中,新的纳米图案化方法将基于两个自组装模型系统进行研究:(1)嵌段共聚物;(2)塌陷纳米柱。对于这两种技术,将开发分析模型,解释地形模板之间的相互作用系统的自组装行动。沿着分析模型,数值模拟将被用于模拟三维结构。一个基于计算和数字逻辑的图案设计的概念框架将被开发出来。在嵌段共聚物的特定情况下,技术发展的中心将是局部退火方法的实施。在塌陷纳米柱的情况下,将开发用于诱导局部和定向塌陷的处理方法。基于分析模型,数值模拟,新的实验方法和计算框架,一种新的方法来产生复杂的纳米粒子将使用这两种方法来证明。作为这项工作的结果,新的纳米制造方法,可以制造复杂的纳米粒子的吞吐量高于传统的光刻方法将被开发。本研究的主要目标是基于对两个模型系统的自组装过程的力或相互作用的理解来控制自组装过程。该控制可以包括制造复杂的纳米芯片,例如弯曲、凹凸或T形结,其可以用于集成电路制造或用于制造用于光子学、能量收集和电子学中的新应用的大规模纳米芯片。由于在本研究中实现了对自组装的控制,纳米制造方法的能力将得到扩展,同时其成本也会降低。
英文摘要
In this project, new nanopatterning methods will be researched for manufacturing based on two self-assembly model systems: (1) block copolymers; and (2) collapsing nanopillars. For both of these technologies, analytical models will be developed explaining the interaction between topographic templates the self-assembling action of the system. Along with the analytical model, numerical simulation will be used to simulate the 3-D structures. A conceptual framework for pattern design based on computation and digital logic will then be developed. In the particular case of block copolymers, central to the technological development will be the implementation of localized annealing methods. In the case of collapsing nanopillars, processing methods for inducing localized and directed collapse will be developed. Based on the analytical model, numerical simulation, the new experimental methods, and the computational framework, a new approach for generating complex nanopatterns will be demonstrated using both of these approaches. As the result of this work, new nanomanufacturing methods that can fabricate complex nanopatterns with throughput higher than that of conventional lithographic methods will be developed. The primary goal of this study is controlling the self-assembly process based on the understanding of the force or interaction governing the self-assembly process of two model systems. The control may include fabricating complex nanopatterns such as bends, jogs, or T-junctions that can be used for integrated circuit fabrication or for fabrication of large-scale nanopatterns for new applications in photonics, energy harvesting, and electronics. As a result of the control of self-assembly to be achieved in this study, the capabilities of nanomanufacturing methods will be expanded, while their costs are reduced.
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