MRI: Acquisition of Thermal Scanning Probe Lithography in a Glovebox for Research and Training in Materials and Devices

该主要研究基础设施（MRI）奖支持在波士顿学院（BC）洁净室和纳米工厂（CNRF）的手套箱中收购热扫描探针光刻（t-SPL）系统。结合波士顿学院的“手套箱中的洁净室”，该系统允许完全在惰性气氛中进行真正的纳米级制造。这种设置相对易于使用，具有上级功能，无需穿戴，并且不需要其他尖端纳米制造工具所需的昂贵基础设施，培训和员工。因此，该项目允许研究人员和当地公司进行快速和低成本的原型设计，对纳米纤维的本科生和研究生进行尖端研究和培训，并将纳入暑期课程和课程。该系统用于BC和该地区的一系列基础，应用和跨学科研究，包括量子材料，催化，微生物相互作用，生物和化学传感器。 手套箱内的Nanofrazor热扫描探针光刻系统使用热尖端来表征表面并去除抗蚀剂。因此，Nanofrazor最大限度地减少了对显影剂的需求，生产出上级表面，具有竞争力的特征尺寸（15 nm），在手套箱中操作，3D书写（15 nm高度分辨率）。对样品的最小制造影响和手套箱中的操作为尖端2D异质结构和通常高度空气敏感的量子材料提供了新的能力。t-SPL还提供了需要优良接触、3D等离子体结构和小尺度的新颖器件架构。这些努力加上快速制造新异质结构的能力（MBE/2D材料）和化合物，通过真空手提箱和一套表征功能进行转移（金刚石氮空位（NV）中心，光电流，STM，TEM，拉曼，磁运输）将放大t的影响，SPL系统。该奖项反映了NSF的法定使命，并被认为是值得通过使用基金会的知识价值和更广泛的影响审查标准进行评估的支持。

This Major Research Infrastructure (MRI) award supports the acquisition of a thermal Scanning Probe Lithography (t-SPL) system in a glovebox to be housed in the Boston College (BC) Cleanroom and Nanofabrication Facility (CNRF). Combined with the Boston College “cleanroom in a glovebox”, this system allows true nanoscale fabrication entirely in inert atmosphere. This setup is relatively easy to use, has superior capabilities that come without needing to gown up, and does not demand expensive infrastructure, training, and staff required by other cutting-edge nanofabrication tools. Thus, the project allows rapid and low-cost prototyping by researchers and local companies, cutting-edge research and training of undergraduate and graduate students in nanofabrication, and will be incorporated into summer programs and classes. The system is employed for an array of basic, applied, and interdisciplinary research at BC and the region including quantum materials, catalysis, microbial interactions, biological and chemical sensors. The Nanofrazor, thermal Scanning Probe Lithography system inside a glovebox uses a thermal tip to both characterize the surface and remove the resist. As such the Nanofrazor minimizes the need for developer, produces superior surfaces to e-beam lithography (EBL) with competitive feature sizes (≈15nm), operates in a glovebox, and 3D writing (≈1nm height resolution). The minimal fabrication impact on the sample and operation in a glovebox provide new capabilities in cutting-edge 2D heterostructures and quantum materials that are often highly air sensitive. The t-SPL also provides novel device architectures requiring excellent contacts, 3D plasmonic structures, and small scales. These efforts together with the ability to rapidly fabricate new heterostructures (MBE/2D materials) and compounds with transfer via vacuum suitcase and a suite of characterization capabilities (diamond Nitrogen-Vacancy (NV) center, photocurrent, STM, TEM, Raman, magneto-transport) will amplify the impact of the t-SPL system.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.