Adaptive aberration compensation in high refractive index materials for next-generation active microphotonic devices

本课题提出的补偿高折射率材料强像差的方法是一种非常有前景的、通用的方法。这种像差的成功补偿将使人们能够直接在高折射率材料中制造微器件。该项目将极大地促进光学制造技术的发展，扩大我国在非线性光子晶体及其相关应用领域的知识。预计该项目将为研究生提供许多参与的机会。在未来，非线性光子晶体及其相关器件可能会在日常生活中得到广泛应用，该项目可能会为行业提供一些机会。

The method proposed in this project is a very promising and versatile method to compensate the strong aberration in a high refractive index material. The successful compensation of such aberration will allow people to fabricate microdevices directly inside high refractive index materials. This project will greatly advance optical fabrication techniques and expand the national knowledge in the area of nonlinear PhCs (photonic crystals) and related applications. It is expected that the project will provide many chances for postgraduate students to be involved. In future, nonlinear PhCs and related devices may be widely used in daily life and this project may provide some opportunities for industry.