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X-ray photoelectron spectroscopy system

X-ray photoelectron spectroscopy system
X射线光电子能谱系统
批准号:
424956935
负责人:
金额:
$0.0万
依托单位国家:
德国
项目类别:
Major Research Instrumentation
财政年份:
2019
资助国家:
德国
项目状态:
未结题
起止时间:
2018-12-31 至 --

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中文摘要
翻译
x射线光电子能谱(XPS)是表征表面和分子化合物的化学组成或氧化还原状态的关键分析方法。所请求的系统将替换一台旧的机器,该机器的故障无法通过Göttingen中的其他资源进行补偿。它将在许多科学项目中用于表征非均相和均相催化剂以及金属、金属硫族化物和聚合物薄膜和异质结构。XPS系统对于加强几个正在运行的合作研究结构、个别项目和计划中的举措是必要的。相关样品的化学表征需要具有高能量分辨率(<1eV)的单色x射线源(Al),同时探测器具有高灵敏度。对含铝样品的检验需要第二个来源。软质材料(聚合物、金属硫族化合物)的深度剖面应通过氩簇溅射实现。识别俄歇峰需要一个电子源。XPS系统将在多用户模式下运行,以实现多个小组的广泛使用和集中维护。因此,计划将其安置在物理系的校园实验室CLUE中,并为大量用户提供访问,特别是化学和物理用户。
英文摘要
X-ray photoelectron spectroscopy (XPS) is a pivotal analytical method for the characterization of, e.g. the chemical composition or redox states of surfaces and molecular compounds. The requested system replaces an older machine, the breakdown of which could not be compensated by other resources in Göttingen. It will be utilized within numerous scientific projects for the characterization of heterogeneous und homogeneous catalysts and metal, metal chalcogenide and polymer films and heterostructures. The XPS system is necessary to strengthen several running collaborative research structures and individual projects and planned initiatives.Chemical characterization of the relevant samples requires a monochromatic X-ray source (Al) with high energy resolution (<1eV) and simultaneously high sensitivity of the detector. A second source is necessary for the examination of Al-containing samples. Depth profiling of soft materials (polymers, metal chalcogenides) shall be enabled by argon cluster sputtering. An electron source is required for the identification of Auger peaks. The XPS system will be run in multi-user mode to enable broad use by several groups and centralized maintenace. It is therefore planned to accommodate it in the joined campus-lab CLUE in the Department of Physics and offer access to a large group of users particularly from chemistry and physics.
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