Study of Phase Changes and Physical Properties in Iron Nitride Films Prepared by Reactive Sputtering
Study of Phase Changes and Physical Properties in Iron Nitride Films Prepared by Reactive Sputtering
批准号:
63460191
负责人:
NITTONO Osamu
金额:
$4.42万
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (B)
财政年份:
1988
资助国家:
日本
项目状态:
已结题
起止时间:
1988 至 1989
中文摘要
氮化铁薄膜具有较大的饱和磁化强度和合理的矫顽力,是理想的记录材料。然而,为了使用这些薄膜作为实际的记录介质,必须克服几个问题,包括在高温下的相稳定性。因此,在本研究中,研究了氮化铁薄膜在高温下的相稳定性以及加热过程中发生的相或结构变化。为了评价溅射膜的性质,还对溅射膜的电阻率进行了测量,同时还对溅射膜的磁性进行了测量。VSM曲线)。主要研究结果如下:(1)通过控制氮气与氩气的比例、衬底温度、放电电压和放电电流,可以制备出氮化铁薄膜。研究还发现,在较高的衬底温度下制备的沉积膜显示出非常尖锐的x射线峰,并由更多的氮化铁膜组成,如ε相、γ′相和α′相。(2)通过原位电镜观察,研究了沉积态氮化铁薄膜在加热过程中的结构变化:溅射态薄膜中含有少量的α相,为局部分布的细颗粒。随着温度的升高,氮原子和铁原子开始发生位置有序,在加热过程中实现了完美有序的Fe_3N相。在不同的加热速率下,观察到从ε相到γ相的两种结构变化,这些特征可以在氮原子和铁原子的扩散和剪切位移的基础上得到很好的解释。考虑了加热过程中相分离和析出现象,较好地解释了不同热处理后VSM曲线的特征。对不同的沉积铁膜进行了沉积膜的电阻率测量。结果表明,在较高的溅射气体压力下制备的沉积膜的电阻率略高。考虑到在沉积薄膜中形成的晶界周围发生了质变,这很好地解释了这一点。对沉积薄膜进行电测量是评价薄膜性能的有效方法。进一步的详细研究正在进行中。少
英文摘要
Iron nitride films are premising recording materials because of large saturation mangetization with a reasonable coercive force. In order to use these films as practical recording media, however, several problems including phase stability at elevated temperatures must be overcome. Therefore, in this study phase stability of iron nitride films subjected to elevated temperatures was examined together with phase or structural change taking place during heating process. Electric resistivity measurement of as-sputtered films was also done in order to evaluate a nature of film property, together with the measurement of magnetic property .(i.e.VSM curve). Main results are as follows:(1) Every iron nitride films were found to be prepared by controlling the ratio of nitrogen gas to argon gas, the substrate temperature, discharge voltage and discharge current. It was also found that as-deposited films prepared at elevated substrate temperatures showed very sharp X-ray peaks and consisted of stab … More le iron nitride films such as epsilon-, gamma'- and alpha- phases.(2) A structural change of as-deposited iron nitride films during heating process was investigated by in-situ electron microscopy observations: as-sputtered films contained a small amount of alpha-phase as locally distributed fine particles. Both nitrogen and iron atoms began to take place an site ordering with increasing temperature, and perfect ordered Fe_3N phase was realized during heating process. Two kinds of structural change from the epsilon phase to gamma' phase were observed for different heating rates: These features are well explained on the basis of both diffusion and shear displacement of nitrogen and iron atoms. Characteristics of VSM curves measured after various heating treatments were well explained by considering phase separation and precipitation occurred during heating process. Electric resistivity measurement of as-deposited films was done for various as-deposited iron films. It was found that as-deposited films prepared under higher sputtering gas pressures showed a slightly higher resistivity. This was well explained by considering that a qualitative change took place around grain boundaries formed in as-deposited films. The electric measurement of as-deposited films was found to be effective for evaluation of film property. Further detailed study is in progress. Less
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Sheng Kai Gong and Osamu Nittono: "Electron Microscopy Observations of Heating Processs of Iron Nitride Films Prepared by Reactive Sputtering" Symposium on Materials Science. 8-9 (1989)
宫盛凯、入野修:“反应溅射制备氮化铁薄膜加热过程的电子显微镜观察”材料科学研讨会。
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通讯作者:
王宝棣、入戸野修: "オ-ステナント系304ステンレス鋼の高周波窒化の研究" 1989年春期日本金属学会講演発表. 130 (1989)
Baoli Wang、Osamu Nitono:“304奥氏体不锈钢高频氮化的研究”1989年春季日本金属学会讲座130(1989)。
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通讯作者:
入戸野修: "膜応力とその物理冶金学的現象の影響" 日本金属学会会報(印刷中). 29. (1990)
Osamu Nitono:“膜应力及其对物理冶金现象的影响”日本金属研究所通报(正在出版)29。(1990)。
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Sheng Kai Gong and Osamu Nittono: "Electron Mocroscopy Observations of Heating Process of Iron Nitride Films Prepared by Reactive Sputtering" Symposium on Materials Science. 8-9 (1988)
宫盛凯、入野修:“反应溅射制备氮化铁薄膜加热过程的电子显微镜观察”材料科学研讨会。
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通讯作者:
Muneaki,Yamaguchi;Sheng Kai Gong;Yoshio,Nakamura;Osamu,Nittono: Materials Transaction, Japan Institute of Metals. 30. (1989)
Muneaki,Yamaguchi;Sheng Kai Kong;Yoshio,Nakamura;Osamu,Nittono:材料学报,日本金属研究所。
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共 19 条
Fabrication of semi-conductor titanium oxide films containing isolated fine iron-based metal particles and measurement of the GMR effect under illumination of UV light
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批准号:15360331
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.54万
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财政年份:2003
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负责人:NITTONO Osamu
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依托单位:
Microstructure and Physical Properties of Magnetic Particles Embedded in Semiconductor AIN Films Having Highly Thermal Conductivity
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$7.55万
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财政年份:1997
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负责人:NITTONO Osamu
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依托单位:
Study on Phase Transformations for New Materials and under Special Conditions
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批准号:09242104
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项目类别:Grant-in-Aid for Scientific Research on Priority Areas
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资助金额:$61.63万
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财政年份:1997
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负责人:NITTONO Osamu
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依托单位:
Structural Properties and Size-control of Visible Photoluminescent Porous Silicon
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批准号:05452273
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$4.54万
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财政年份:1993
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负责人:NITTONO Osamu
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依托单位:
Preparation of stable iron nitride films by high speed reactive sputtering
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批准号:63850152
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项目类别:Grant-in-Aid for Developmental Scientific Research
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资助金额:$3.39万
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财政年份:1988
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负责人:NITTONO Osamu
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依托单位: