Control of single electrons using bonor levels in silicon
Control of single electrons using bonor levels in silicon
批准号:
16206038
负责人:
ONO Yukinori
金额:
$30.78万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
2004
资助国家:
日本
项目状态:
已结题
起止时间:
2004 至 2007
中文摘要
半导体加工技术的最新进展引起了人们对单电子操纵技术的关注,这种技术利用了限制在微小区域的电子的静电能量。这项技术涉及到所谓的人造原子和人造分子的使用,并且具有非常广泛的应用领域,包括集成电路,传感器,电气标准,激光和量子计算机。我们的目标是建立全新的单电子操纵技术,使用半导体材料的实际原子(真原子)而不是人造原子。我们的相关研究是实现这一目标的第一步,并将供体位点引入硅中作为“真正的原子”。特别是,我们的目标是建立检测单个供体位点和捕获和释放单个供体电子的技术。考虑到在掺杂剂方面已经积累了大量的技术以及其应用的溢出效应,我们希望用硅来进行单供体控制。本研究主要采用磷和硼作为掺杂剂,因为它们在硅中的行为已经研究了很长时间。通过研究包含大量掺杂剂(磷或硼)的大尺寸MOS晶体管在通道中冻结状态下的强电场下的电离现象,我们已经证明了用电场进行电荷控制是可能的。我们还成功地探测到了纳米晶体管中的单个硼原子。这些结果是本研究课题的主要目的,因此可以认为本研究的目的已经达到。
英文摘要
Recent advances in semiconductor processing technology have drawn attention to single-electron manipulation techniques that utilize the electrostatic energy of electrons confined to minute regions. This technology involves the use of so-called artificial atoms and artificial molecules, and has a very wide range of applicable fields including integrated circuits, sensors, electorical standards, lasers and quantum computers. Our goal is to establish completely new single-electron manipulation techniques that use actual atoms of semiconductor material(true atoms) instead of artificial atoms. Our research relating to this submission is the first step towards achieving this goal, and uses donor sites introduced into silicon as "true atoms". In particular, we aim to establish techniques for the detection of individual donor sites and the capture and release of individual donor electrons.Considering the vast amount of technology that has already been accumulated with regard to dopants and the spill-overeffects of their applications, it is desirable that single-donor control is performed using silicon In this study, we mainly employed phosphorus and boron as the dopants because their behavior in silicon has been researched for a long time, By investigating ionization phenomena under a strong electric field from the freeze-out state of a macro-size MOS transistor including large quantities of dopant(phosphorus or boron) in the channel, we have shown that it is possible to perform charge control with an electric field. We have also succeeded in the detection of single boron atoms in a nano-transistor. These results are the principal aim of this research topic, and it can thus be considered that the aims of this study have been achieved.
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Charge-state control of phosphorus donors in silocon-on-insulator Metal-oxide-semiconductor field-effect transistors
绝缘体上硅金属氧化物半导体场效应晶体管中磷供体的电荷态控制
DOI:
--
发表时间:
2005
期刊:
Japanese Journal of Applied Physics Vol.44,No.4B
影响因子:
--
作者:
[Kazuya, Masu, Yukinori Ono]
通讯作者:
Yukinori Ono
Anomalous resistance ridges along filling factor v=4i
沿填充因子 v=4i 的异常电阻脊
DOI:
--
发表时间:
2007
期刊:
Phys. Rev. Letts. 99
影响因子:
--
作者:
[K. Takashima, M. Brun, T. Ota, D. K. Maude, A. Fujiwara, Y. Ono, Y. Takahashi, and Y. Hirayama]
通讯作者:
and Y. Hirayama
Charge-state control of phosphorus donors in SOI MOSFET
SOI MOSFET 中磷施主的电荷状态控制
DOI:
--
发表时间:
2004
期刊:
影响因子:
--
作者:
[澤本佳和, 森田耕次, 原田幸博, 吉貝滋, 深田良雄, 田中直樹, Y.Ono]
通讯作者:
Y.Ono
DOI:
--
发表时间:
2005
期刊:
影响因子:
--
作者:
[J.T.Okada, M.Inui, D.Ishikawa, S.Tsutsui, A.Q.R.Baron, K.Matsuda, Y.Yokoyama, Y.Watanabe, T.Ishikawa, S.Nanao, R. TAKAKI, Y. Ono]
通讯作者:
Y. Ono
DOI:
--
发表时间:
2004
期刊:
影响因子:
--
作者:
[K. Ohashi, T. Yammouch, M. Kimura, H. Ito, K. Okada, K. Ishida, K. Itoi, M. Sato, T. Ito, and K. Masu, Yuji MURAKAMI, K.Nishiguchi]
通讯作者:
K.Nishiguchi
共 93 条
Research on single-atom inelastic tunneling spectroscopy and atomic scale energy transfer
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批准号:25600015
-
项目类别:Grant-in-Aid for Challenging Exploratory Research
-
资助金额:$2.58万
-
财政年份:2013
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负责人:ONO Yukinori
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依托单位:
Silicon Single-Dopant Electronics
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批准号:20241036
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$30.95万
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财政年份:2008
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负责人:ONO Yukinori
-
依托单位:
海外基金