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Fundamental Clarification of Triboelectromagnetic Phenomena andDevelopment of Triboplasma Application Technology

Fundamental Clarification of Triboelectromagnetic Phenomena andDevelopment of Triboplasma Application Technology
摩擦电磁现象的基本阐明及摩擦等离子体应用技术的发展
批准号:
20246035
负责人:
NAKAYAMA Kleiji
金额:
$29.95万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
2008
资助国家:
日本
项目状态:
已结题
起止时间:
2008 至 2012

项目摘要

项目成果

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中文摘要
翻译
以摩擦等离子体的产生为重点,分析了摩擦电磁现象的基本机理,提出了摩擦等离子体应用技术发展的指导思想。结果表明,即使在滑动接触内部也会产生摩擦等离子体,而在油润滑条件下滑动接触内部的光子发射是由溶解气体分子的激发引起的。成功地测量了摩擦等离子体的温升,证明摩擦等离子体是非平衡低温等离子体。分析了滑动面的光子发射机制是由等离子体中电子的攻击引起的,并从理论上分析了摩擦等离子体的产生,给出了带隙内的电势和带电粒子分布。在此基础上,用新模型进一步阐明了油润滑下摩擦等离子体的产生机制是由于滑动接触后间隙空穴中的电子雪崩过程所致。提出了通过施加磁场和控制摩擦材料的电阻率来控制摩擦等离子体。
英文摘要
Fundamental mechanism of the triboelectromagnetic phenomena was analyzed focusing on the triboplasma generation and the guideline to the development of the triboplasma application technology was proposed. It was found that the triboplasma is generated even inside the sliding contact, and the photon emission from the inside of sliding contact under oil lubrication was shown to be caused by the excitation of the dissolved gas molecules. The temperature rise of the triboplasma was successfully measured to give that the triboplasma is non-equilibrium low temperature plasma. The mechanism of photon emission from the sliding surface was analyzed to be caused by the attack of the electrons in the plasma, and the triboplasma generationwas theoretically analyzed to give the potential and the charged particle distributions in the gap. Further, the mechanism of triboplasma generation under oil lubrication was clarified to be due to the electron avalanche process in the cavity formed in the rear gap of the sliding contact with a new model. It was proposed that triboplasma can be controlled by magnetic field application and control of the electric resistivity of tribomaterials.
期刊论文(69)
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科研奖励(0)
会议论文
Characterization of crystallographic defects in homoepitaxial diamond films by synchrotron X-ray topography and cathodoluminescence ECSCRM 2010
通过同步加速器 X 射线形貌和阴极发光表征同质外延金刚石薄膜中的晶体缺陷 ECSCRM 2010
DOI: --
发表时间: 2010
期刊:
影响因子: --
作者: [H.Umezawa, Y.Kato, A.M.M.Omer, H.Yamaguchi, S.Shikata]
通讯作者: S.Shikata
TSEE Phenomena from Defects in Insulators Formed by Scratching and Electron Bombardment
划痕和电子轰击形成的绝缘体缺陷的 TSEE 现象
DOI: --
发表时间: 2011
期刊:
影响因子: --
作者: [A.Gatsenko, Keiji Nakayama]
通讯作者: Keiji Nakayama
DOI: 10.1088/0022-3727/42/7/075307
发表时间: 2009-04-07
期刊: JOURNAL OF PHYSICS D-APPLIED PHYSICS
影响因子: 3.4
作者: [Matta, C., Eryilmaz, O. L., Nakayama, K.]
通讯作者: Nakayama, K.
Tribology of Diamond-Like Carbon Films : chapter 11 - Triboemission and triboplasma generation with DLC films(54, 査読有)
类金刚石碳薄膜的摩擦学:第 11 章 - DLC 薄膜的摩擦发射和摩擦等离子体生成(54,同行评审)
DOI: --
发表时间: 2008
期刊:
影响因子: --
作者: [Van Ho, Shinichi Hirai, 山田純, K.Nakayama]
通讯作者: K.Nakayama
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