Control of generation, growth, and behavior of particles in ablation plasma plume by electrmagnie field

脉冲激光沉积(PLD)方法具有系统设置简单、沉积条件范围广、可使用多种材料、瞬时沉积速率高等优点，在过去的几年中已成为一种广泛使用的薄膜沉积技术。由于该系统的沉积面积由等离子体羽流的大小决定，因此无法制备大面积的薄膜。由于羽流中等离子体密度的三维分布不均匀，该系统沉积的薄膜厚度不均匀。用这种方法沉积的薄膜表面沉积了许多微米级的液滴。在用这种方法生长的薄膜上几乎总是可以观察到这种现象。从薄膜质量的角度来看，这些微米级液滴的存在是PLD工艺的主要缺点。要解决这些问题并准备…为了获得更大面积、均匀、无液滴的薄膜，发展了一种新的交叉磁场PLD方法。研究了交变磁场对PLD法制备大面积无液滴均匀薄膜的影响，利用ICCD相机测量了等离子体羽流的二维发射分布，改变了交变磁场中等离子体羽流的形状。与非交变磁场相比，交变磁场中衬底上的液滴密度降低。这些实验结果表明，利用交变磁场可以制备出高质量、大面积均匀的薄膜。此外，基于这种通用性，我们还利用交变磁场的PLD方法开发了碳化钨、碳化硅、碳化铬、立方氮化硼、氮化碳和氮化硅等多种功能薄膜。与非磁场相比，所有这些薄膜的质量都有所提高。较少

Pulsed Nd : YAG laser deposition (PLD) method has become a widely used technique for the deposition of thin films in the past few years due to the advantages of simple system setup, a wide range of deposition conditions, the possibility of using many kinds of materials, and a high instantaneous deposition rate.On the other hand, several problems with the PLD method have been pointed out. Because the deposition area of this system is determined by the size of the plasma plume, large-area thin films cannot be prepared. The thickness of the film deposited by this system is not uniform because the three-dimensional profile of the plasma density in the plume is not uniform. Many micron-sized droplets are superimposed on the surface of films deposited by this method. This phenomenon is almost always observed on films grown by this method. The presence of these micron-sized droplets is the main drawback of the PLD process from the viewpoint of film quality. To solve these problems and prepare … More large-area uniform thin film without droplets, a new PLD method with a cross-magnetic field has been developed. In this paper, we report the effects of the cross-magnetic field on preparing large-area uniform film without droplets by the PLD method.Two-dimensional emission profiles of the plasma plume were detected with an ICCD camera, and the shape of the plasma plume in the cross-magnetic field was changed. The density of the droplets on the substrate in the cross-magnetic field decreased in comparison with that in a non-cross-magnetic field. These experimental results suggest that high-quality and large-area uniform thin film can be prepared by using a cross-magnetic field.In addition, because of this versatility, we have developed several kinds of functional thin films such as tungsten carbide, silicon carbide, chromium carbide, cubic boron nitride, carbon nitride, and silicon nitride by using the PLD method with cross-magnetic field. All of these films' quality increase, as compared with non-magnetic field. Less