Analysis of Two Dimensional Velocity Space Structure of Ions in Simulated Divertor Plasma With High Angular

导流等离子体的一个重要问题是如何减小内部等离子体对导流板的热负荷，而导流板在核聚变反应堆中经常发生溅射。在讨论板的溅射时，弄清入射到板上的离子的能量和温度的二维行为是很重要的。本文在直流放电等离子体中测量了离子的二维速度分布。采用电感耦合等离子体在模拟分流体中进行了离子温度测量。本文还测量了电子回旋共振微波等离子体中离子入射到负偏基底的能量分布函数。在这些测量中，使用了网格和定向分析仪。离子行为的有趣结果如下：1。用定向分析仪测量离子二维速度空间结构为了进行离子速度分布的基础实验，采用毛细管板、缓速栅和离子收集器组成的定向分析仪测量了do放电双等离子体的二维速度分布函数。该分析仪具有1.4度的高角分辨率。根据得到的各方向速度分布函数估计出二维离子速度空间图。结果表明，定向分析仪可以对离子在二维速度空间上的扩散进行评价。受激分流等离子体的研制电感耦合等离子体（ICP）源采用3转螺旋天线绕玻璃管缠绕3cm作为受激分流等离子体之一。获得了电子密度为10^<12> cm^< 3>的最佳受激分流等离子体3。在发散磁组态下，对ICP中的离子测量Ti和电子温度Fe进行了比较。研究了磁场和气体压力对T_e和T_i的依赖关系。当离子空穴参数hi大于等于3时，T_i减小，而当电子空穴参数h_e大于等于200时，T_i急剧减小，当h_e大于等于10^3时，T_i达到饱和。在后一种情况下，非磁化等离子体（B=0）的T_e与磁通密度B= 557g时的T_i具有相同的气体压力趋势，而B=575G时的Te随着压力的增大而逐渐减小。从离子等离子体频率的角度研究了ECR微波等离子体中入射到射频偏置衬底的离子的时间平均能量分布函数。结果表明，TIIEDF在f_<pi>/f_<b->范围内呈双峰分布，其中fpi和fb分别为离子等离子体频率和射频偏频。发现即使f_<pi>/f_b<<1，在高rf偏置电压下也能观察到双峰分布。结果表明，当f_<pi>/f_b<1时，tiiedf的能量差随rf偏置电压的增大而增大，而当f_<pi>/f_b>时，能量差随f_<pi>/f_<b->的增大而减小。少

One of important problems in divertor plasma is to reduce the heating load from internal plasma to divertor plate where the sputtering of the plate is frequently, occurred in nuclear fusion reactor. When the sputtering of the plate is discussed, it is important to clarify two dimensional behavior of energy and temperature of ions incident to the plate. In this work, measurement of two dimensional velocity distributions of ions has been performed in DC discharge plasma. Ion temperature measurement has been done in simulated divertor plasma using inductively coupled plasma. Energy distribution functions of ions incident to substrate biased negatively has also measured in electron cyclotron resonance microwave plasma. In these measurements, grid and directional analyzers were used. The interesting results on ion behaviors were obtained as follows.1.Measurement of ion two-dimensional velocity space structure by means of directional analyzerFor fundamental experiment on ion velocity distrib … More ution, two dimensional velocity distribution functions were measured in do discharge double plasma using directional analyzer which was consisted from capillary plate, retarding grid and ion collector. The analyzer has a high angular resolution of 1.4 degree. The two dimensional ion velocity space maps were estimated from velocity distribution functions obtained at all directions. It was confirmed that the directional analyzer could evaluate the spread on two dimensional ion velocity spaces.2.Development of stimulated divertor plasmaInductively coupled plasma (ICP) source where 3 turns helical antenna was wounded around glass tube with 3 cm, is used as one of the stimulated divertor plasma. ICP with electron 'density of 10^<12> cm^<-3> was obtained for optimum stimulated divertor plasma.3.Ion measurement in ICPIon measurement Ti was done comparing with electron temperature Fe in ICP under a divergent magnetic configuration. The dependency of the magnetic field and gas pressure on both of T_e and T_i was also studied. In the former case, T_i was found to decrease for ion hole-parameter hi【greater than or equal】3, while Te decreased drastically for electron hole-parameter h_e【greater than or equal】200 and saturated for h_e【greater than or equal】10^3. In the latter case, T_e in, a non-magnetized plasma (B=0) provides the same gas pressure tendency as the T_i at magnetic flux density B=575G, while Te at B=575 G decreased, gradually with the pressure.4.Measurement of energy distribution of ions incident to RF biased substrateTime averaged energy distribution functions of ions impacted in the rf-biased substrate have been investigated in ECR microwave plasma from the viewpoint of the ion plasma frequency. It was observed that TIIEDF has a bimodal profile for a wide range of f_<pi>/f_<b-> Here fpi and fb are ion plasma frequency and RF biased frequency, respectively. It was found that even for f_<pi>/f_b<<1, the bimodal profile was observed at high rf-biased voltages. It was revealed that the energy difference in TIIEDFs increased with increasing the rf-biased voltage for f_<pi>/f_b<1, while for f_<pi>/f_b>1, the energy difference decreased with increasing f f_<pi>/f_<b->. Less