Development of a non-destructive measurement system of nanoscale properties of materials using carbon nanotubes

本研究旨在开发一种以碳纳米管为探针的材料纳米尺度性能无损测量系统。碳纳米管探针是必要的，以减少探针之间的距离的大小，因为它们的新的结构特性方面的小直径和高纵横比。在这项研究中，碳纳米管探针已成功地制造使用微波增强等离子体CVD技术，其中使用避雷针的最佳生长条件被施加到传统的钨探针的顶点上选择性地生长碳纳米结构。通过对石墨表面晶格像的观察，证实了所制备的碳纳米管探针的性能。在无损检测方面，我们提出了一种新的接近系统。利用该系统，采用四探针法测量了Si（111）晶片的电阻率，探针间距从18 μm变化到500 μm。考虑到非半无限介质的校正因子，测得的电压与探针间距曲线具有高度可重复性，并且定性上与预期行为非常一致。最后，我们开发了一个新的测量系统的基础上，零的方法，以消除接触电阻，其中偏置-双绞线是新设计的，并在这项研究中进行了评估。

This study aims to develop a non-destructive measurement system of nanoscale properties of materials using carbon nanotubes (CNT) as probes. CNT probes are necessary to reduce the size of the distance between probes, because of their novel structural properties in terms of small diameter and high-aspect ratio. In this study, carbon nanotube probes have been successfully fabricated using microwave enhanced plasma CVD technique, where optimum growth condition using lightning conductor is applied to grow carbon nanostructures selectively onto the apex of conventional tungsten probes. The performance of the :prepared CNT probe has been confirmed by the observation of lattice image of graphite surface. As for the non-destructive measurement, we have proposed a new approaching system. Using this system, the resistivity of a Si(111) wafer is measured by the four-point probe method with the probe spacing changed from 18 μm to 500 μm. The measured voltage vs. probe spacing curve is highly reproducible and is qualitatively in good agreement with the expected behavior, taking into account the correction factor for a non-semi-infinite medium. Lastly, we have developed a new measurement system based on null method to eliminate contact resistance, where biased-preamplifier is newly designed and evaluated in this study.