Loss compensation in integrated planar devices for optical signal processing by erbium-doped waveguide amplifiers

该项目的目的是获得有关集成光放大器的可实现性的重要见解，该集成光放大器可用于补偿集成在同一芯片上的光信号处理元件的插入损耗。该项目计划包括在CMOS兼容的氮氧化硅和碳氧化硅平面波导平台上制作光放大器结构和样品的实验表征。这些活动的结果将有助于评估在这些技术平台上实现光放大的可能性。此外，还可以获得具有基础相关性的新见解，例如所研究的材料系统中铒离子的光学特性。

The objective of the project is to gain important insights about the realizability of integrated optical amplifiers which can be deployed to compensate the insertion loss of optical signal processing components integrated on the same chip. The project plan comprises the fabrication of optical amplifier structures in the CMOS compatible silicon-oxynitride and -oxycarbide planar waveguide platforms and theexperimental characterization of samples. The results of the activities will help to assess the realizability of optical amplification in these technology platforms. In addition, new insights with fundamentalrelevance can be gained such as the optical characteristics of erbium ions in the investigated material systems.