A furnace stack for advanced photovoltaic, photonic and microfabrication applications

先进的硅光伏器件、光子器件、光电器件和微机电器件需要用于沉积薄介电膜和用于器件的受控掺杂的最先进的处理设备。关键技术包括化学计量和富硅氮化硅和二氧化硅薄膜的沉积，以及用硼和磷控制晶片掺杂。将采购最先进的炉堆，其将满足工业相关晶片尺寸高达150 mm的这些要求。这些设备将支持上述领域的广泛研究项目，从基础研究到与行业合作伙伴合作开展的应用研究。

Advanced silicon photovoltaic, photonic, optoelectronic and micro-electromechanical devices require state of the art processing equipment for the deposition of thin dielectric films and for controlled doping of the devices. Key techniques include the deposition of stoichiometric and silicon rich silicon nitride and silicon dioxide films, and the controlled wafer doping with boron and phosphorus. A state of the art furnace stack is to be procured which will satisfy these requirements on industrially relevant wafer sizes up to 150mm. The equipment will support a broad range of research projects in the above fields, ranging from fundamental investigations to applied research carried out in collaboration with industry partners.