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Precise Purity Evaluation of High-Purity Metals by Residual Resistivity Ratio

Precise Purity Evaluation of High-Purity Metals by Residual Resistivity Ratio
通过残余电阻率比精确评估高纯金属的纯度
批准号:
09650803
负责人:
MIMURA Kouji
金额:
$0.64万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1999

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中文摘要
翻译
For purification of metals,the evaluation of the purified metals应该成为一个重要主题,因此the residual resistivityratio (RRR = ρ D2298K - D2/ρ d24.2 K - D2) has been widely used to estimate the purity of high-puritymetals. However, to evaluate the metal-purity with high accuracy by RRRthere are some problems to be considered.In this work,the residual resistivity ratios for several high-purity metals, such as Cu, Fe, Co and Cr,prepared by the various purification processes have been measured and the influence of the annealing条件,大小效应the purity and the remaining trace impurities of the measured specimens on the RRR values has beenexamined,respectively. The main results are follows.(1) The optimum annealing conditions of The specimen wirebefore the RRR measurement have been studied and the most suitable annealing temperature and periodwere determined for high-purity Cu, Fe, Co and Cr,(2) For the size effect of RRR on high-purity Cu,the relationship between RRR D2W D2 measured for the wires,RRR - D2 of the bulk copper and the specimen diameter has been determined. the RRR - D2W - D2 isfound to be dependent largely on the specimen diameter. Then,the influence of the size effect must be considered carefully whenever to evaluate and to compare(3)与RRR values with the increasing tendencies of the RRR values with the high-purity metals by RRRraising in the specimen purity in the range of 99.9% to above 99.999% have been made clear for Cu,Fe and Co.(4) Dependence of the RRR on the concentration of some trace impuritieslike phosphorous in high-purity Fe, has been determined quantitatively。
英文摘要
For purification of metals, the evaluation of the purified metals should be an important subject. So the residual resistivity ratio (RRR = ρィイD2298KィエD2/ρィイD24.2KィエD2) has been widely used to estimate the purity of high-purity metals. However, to evaluate the metal-purity with high accuracy by RRR, there are some problems to be considered.In this work, the residual resistivity ratios for several high-purity metals, such as Cu, Fe, Co and Cr, prepared by the various purification processes have been measured and the influence of the annealing condition, the size effect, the purity and the remaining trace impurities of the measured specimens on the RRR values has been examined, respectively. The main results are follows.(1) The optimum annealing conditions of the specimen wire before the RRR measurement have been studied and the most suitable annealing temperature and period were determined for high-purity Cu, Fe, Co and Cr, respectively.(2) For the size effect of RRR on high-purity Cu, the relationship between RRRィイD2WィエD2 measured for the wires, RRRィイD2BィエD2 of the bulk copper and the specimen diameter has been determined. The RRRィイD2WィエD2 is found to be dependent largely on the specimen diameter. Then, the influence of the size effect must be considered carefully whenever to evaluate and to compare the purity of the high-purity metals by RRR.(3) The increasing tendencies of the RRR values with raising in the specimen purity in the range of 99.9% to above 99.999% have been made clear for Cu, Fe and Co.(4) Dependence of the RRR on the concentration of some trace impurities, like phosphorous in high-purity Fe, has been determined quantitatively.
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M. Uchikoshi: "Copper Purification by Anion-Exchange Separation in Chloride Media"Materials Transactions JIM. Vol. 38, No. 12. 1083-1088 (1997)
M. Uchikoshi:“通过氯化物介质中的阴离子交换分离来纯化铜”Materials Transactions JIM。
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共 13 条
    Purification of refractory metals used for the sputtering target
    • 批准号:
      22360311
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $7.49万
    • 财政年份:
      2010
    • 负责人:
      MIMURA Kouji
    • 依托单位:
    Purification of sputtering target metals for high-k insulator films of MOSFET devices
    • 批准号:
      19360339
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $8.15万
    • 财政年份:
      2007
    • 负责人:
      MIMURA Kouji
    • 依托单位:
    Purification of Rare Earth Metals by Advanced Electron Beam Floating Zone Melting Method
    • 批准号:
      04650609
    • 项目类别:
      Grant-in-Aid for General Scientific Research (C)
    • 资助金额:
      $1.15万
    • 财政年份:
      1992
    • 负责人:
      MIMURA Kouji
    • 依托单位: