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Physical vapour deposition

Physical vapour deposition
物理气相沉积
批准号:
519675664
负责人:
金额:
$0.0万
依托单位:
依托单位国家:
德国
项目类别:
Major Research Instrumentation
财政年份:
2023
资助国家:
德国
项目状态:
未结题
起止时间:
2022-12-31 至 --

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中文摘要
翻译
计算机科学与微系统技术系和研究重点领域“集成小型化系统”(IMS)需要一个物理气相沉积(PVD)系统来研究现代微纳米系统。IMS研究重点领域(www.hs-kl.de/ims)非常成功,开展了大量主要由第三方资助的研究项目,并发表了高质量的科学出版物。一个特别的研究重点是生命科学和微系统技术接口的跨学科项目,例如,开发新的生物传感器,电极阵列和电生理测量系统。为了制造这样的系统,所申请的PVD需要作为洁净室制造工艺链的中心组件。迫切需要采购,因为由于设备老化和无法维修,目前可用的系统只能在有限的范围内使用。PVD特别适用于在衬底上沉积非常薄的层,直至部分单层,特别是导电金属。这些层具有优良的质量和均匀性,满足苛刻的微系统研究的要求。PVD是微系统技术中已建立的工艺,特别用于生产电极和导电轨道,例如用于从单个细胞或组织中获取神经元或其他电生理信号的生物传感器或电极阵列。不同材料类别的组合使新型传感器系统的生产和研究成为可能。例如,在生物传感器领域,石墨烯和其他纳米材料现在发挥着重要作用,需要由金或铂制成的金属引线。在磁传感器领域,铁、镍、钴、钼的复合层体系的应用越来越广泛。需要一个通用的PVD系统来沉积这些不同的材料。特别是,对于高密度和低缺陷涂层的沉积,该系统需要电子束蒸发源,其源可以在真空下改变。为了快速沉积较厚的涂层,需要额外的热沉积源。通过使用该系统制造新的微纳米结构,我们期望在正在进行和计划的研究项目的背景下获得很高的知识。PVD系统是洁净室工艺链中的重要环节,将由现场其他现有设备补充。本部门在洁净室设施的操作方面有多年的经验。操作工具所需的所有人员和基础设施已经在现场到位。
英文摘要
The Department of Computer Sciences and Microsystems Technology, and the research focus area "Integrated Miniaturized Systems" (IMS) require a system for physical vapor deposition (PVD) to research modern micro- and nanosystems. The IMS research focus area (www.hs-kl.de/ims) is very successful and conducts numerous, mainly third-party funded, research projects, with high quality scientific publications. A particular research focus is on interdisciplinary projects at the interface of life sciences and microsystems technology, developing, for example, novel biosensors, electrode arrays and electrophysiological measurement systems. To manufacture such systems, the PVD applied for is needed as a central component of a fabrication process chain in the clean room. The procurement is urgently required because the currently available system can only be used to a limited extent due to the age of the equipment and its inability to be repaired. PVD is particularly suitable for depositing very thin layers, up to partial monolayers, especially of electrically conductive metals, on a substrate. These layers have excellent quality and homogeneity, meeting the requirements of demanding microsystems research. PVD is an established process in microsystems technology and is used in particular to produce electrodes and conductive tracks, e.g. for biosensors or electrode arrays for deriving neuronal or other electrophysiological signals from individual cells or tissues. The combination of different material classes enables the production and research of novel sensor systems. For example, in the field of biosensors, graphene and other nanomaterials now play an important role, requiring metallic leads made of gold or platinum. In the field of magnetic sensors, complex layer systems of iron, nickel, cobalt and molybdenum are increasingly being used. A versatile PVD system is needed to deposit these different materials. In particular, for the deposition of high-density and low-defect coatings, the system requires an electron beam evaporation source with sources that can be changed under vacuum. For fast deposition of thicker coatings, additional sources for thermal deposition are needed. By using this system for the fabrication of novel micro- and nanostructures, we expect a high gain in knowledge in the context of ongoing and planned research projects. The PVD system is an important link in a process chain in the clean room and will be complemented by other existing equipment on site. The department has many years of experience in the operation of cleanroom facilities. All personnel and infrastructure requirements for operating the tool are already in place at the site.
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