NOVEL GRAPHITE INTERCALATION COMPOUNDS CONTAINING FLUORINE, THEIR PROPERTIES AND MANIFESTATION OF FUNCTIONALITY.
NOVEL GRAPHITE INTERCALATION COMPOUNDS CONTAINING FLUORINE, THEIR PROPERTIES AND MANIFESTATION OF FUNCTIONALITY.
批准号:
03650621
负责人:
TOUHARA Hidekazu
金额:
$1.22万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (C)
财政年份:
1991
资助国家:
日本
项目状态:
已结题
起止时间:
1991 至 1992
中文摘要
1.氟-石墨层间化合物C_xF随着反应温度的降低,氟层间化合物C_xF的插层速率增加,在较低的温度范围(RT -78 ℃)下,长时间(14-140天)可形成组成范围较宽(3<x<13)的C_xF。在SbF_3或HF存在下,插层速率比纯氟快得多,反应时间小于7天即可形成C_xF(3<x<13)。2. C_xF的结构和C-F键的性质低氟含量的C_xF的插层厚度d_i为2.7埃/cm ~ 2,表明插层物种是氟离子,并且位于石墨层之间的中间。当氟含量超过C_6F时,C-F键的性质由离子型变为半离子型,第二级C_xF的单位周期I_c变为10.6A ^^Ω。这表明插入的氟原子不是在石墨层之间的中间位置。3.电荷转移和面内电导率 ...更多信息 > <ab>C_xF的σ_值随着氟含量的增加而增加,并在x=8.4时显示最大值(σ_<ab>= 2.25x10^5 S/cm)。最大值为ca。比原始石墨晶体高10倍。在达到最大值后,σ_<ab>i随氟含量的增加而减小,含半离子C-F键的富氟C_xF(x<3)几乎是绝缘体,这是由于半离子C-F键的形成使π电子局域化。通过对二级化合物C_ F的反射光谱的定性分析,推断出其某些物理性质<6.1>。费米能级为0.72eV,碳原子电荷转移和氟原子电荷转移分别为0.01和0.07。4.第一阶段氟砷酸石墨的有序-无序转变。第一阶段氟砷酸石墨层间化合物C_ AsF_6的Guinier-Simon X射线衍射数据<16>表明,它在约400 ℃发生了有序-无序转变。170 K时,AsF_6^-阴离子的F-配体位于石墨层的碳原子六边形中,低温相的阴离子具有三维有序性。少
英文摘要
1.Fluorine-Graphite Intercalation Compounds C_xF The rate of fluorine intercalation increases with decreasing reaction temperature, and C_xF with the wide composition range (3<x<13) are formed by long reaction times (14-140 days) at a low temperature range (RT - -78゚C). The rate of intercalation in the presence of SbF_3 or HF is much faster then that of pure fluorine, and C_xF (3<x<13) are formed by a shorter reaction time than 7 days.2.Structure of C_xF and Nature of C-F bond The intercalate thickness d_i of C_xF with lower fluorine content than x=6 is 2.7 A^^゚, indicating that intercalated species are fluoride ion and are in the midway between graphite galleries. When the fluorine content exceeds that of C_6F, the nature of C-F bond varies from ionic to semi-ionic and the identity period I_c of stage-2 C_xF becomes 10.6 A^^゚. This suggests that intercalated fluorine atoms are not in the midway between graphite galleries.3.Charge Transfer and In-Plane Electrical Conductivity sigma_<ab … More > Values of sigma_<ab> of C_xF increase with increasing fluorine content and show the maximum (sigma_<ab> = 2.25x10^5 S/cm) at x=8.4. The maximum value is ca. 10 times higher than that of pristine graphite crystal. After the maximum, sigma_<ab> decrease with increasing fluorine content and the fluorine-rich C_xF (x<3) with semi-ionic C-F bond are almost insulators because of pi-electron localization by the semi-ionic C-F bond formation. The some physical properties are deduced by the qualitative analysis of reflectance spectra for stage-2 compound C_<6.1>F. The fermi energy is 0.72 eV, and the charge transfer per carbon atom and the charge transfer per fluorine atom are 0.01 and 0.07, respectively.4.The Order-Disorder Transition of Stage-1 Graphite Fluoroarsenate. Guinier-Simon X-ray diffraction date for the stage-1 graphite fluoroarsenate intercalation compound, C_<16>AsF_6, indicate that it undergoes an order-disorder transition at ca. 170 K and has the F-ligands of AsF_6^- anions nestled in contiguous three-fold sets of carbon-atom hexagons of the enclosing graphite layers with 3-dimensional ordering of the anions in the low temperature phase. Less
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沖野不二雄: "イメージスキャナーによるデバイシェラー粉末回折写真の読み取りとパソコンによるデータ処理" 炭素. 148. 166-171 (1991)
Fujio Okino:“使用图像扫描仪读取 Debye-Scherrer 粉末衍射照片并使用计算机进行数据处理”Carbon,148. 166-171 (1991)。
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通讯作者:
H.Touhara and F.Okino: "Novel Graphite Intercalation Compounds with Fluorine and Fluorides:Synthetic Pathways,Properties and Manifestation Mechanism of Functionality." Proceeding of Materials Sciene and Engineering Society,in press.
H.Touhara 和 F.Okino:“含氟和氟化物的新型石墨插层化合物:合成途径、性能和功能表现机制”。
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沖野不二雄,東原秀和: "グラファイト層間化合物" エレクトロニク・セラミクス. 23. 18-26 (1992)
Fujio Okino,Hidekazu Higashihara:“石墨插层化合物”电子陶瓷 23. 18-26 (1992)。
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F. Okino: "Reading of Debye-Scherrer Films by Image Scanner and The Data Processing by Personal Computer." Tanso (Jpn., J. Carbon Soc.). vol 148. 166-171 (1991)
F. Okino:“通过图像扫描仪阅读德拜-谢勒电影和通过个人计算机进行数据处理。”
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F. Okino and H. Touhara: "Graphite Intercalation Compounds." Jpn., Electronic-Ceramics. vol 23. 18-26 (1992)
F. Okino 和 H. Touhara:“石墨插层化合物”。
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共 11 条
PREPARATION OF CARBON CLUSTERS WITH CONTROLLED ELECTRONIC PROPERTIES AND THEIR POTENTIAL USE
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批准号:11555229
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项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$7.17万
-
财政年份:1999
-
负责人:TOUHARA Hidekazu
-
依托单位:
PROPERTIES AND MANIFESTATION OF FUNCTIONALITY OF CARBON-pi ELECTRON SYSTEM.
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批准号:07650986
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$1.6万
-
财政年份:1995
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负责人:TOUHARA Hidekazu
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依托单位:
Design and Control of Graphite Intercalation Reactions in Liquid Hf.
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批准号:01550593
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.54万
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财政年份:1989
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负责人:TOUHARA Hidekazu
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依托单位:
Preparation and Properties of Fluoride-Graphite Intercalation Compounds with Different Oxidation Number of Intercalant
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批准号:60550552
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$0.64万
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财政年份:1985
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负责人:TOUHARA Hidekazu
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依托单位:
海外基金