Development of X-ray diffractomator to realize in-situ observation of crystal growth

近年来，先进半导体器件的表面和界面结构需要在原子尺度上进行控制，研究表面和界面真实结构的技术变得越来越重要。为了实现对传统晶体生长系统中半导体器件结构的原位观察，研制了一种将X射线源、探测器和样品全部固定在一起的专用X射线衍射仪。利用两个Johanson单色器晶体，设计并研制了一种内置式X射线光学系统，实现了无运动的原位观测。使用专门设计用于新光学系统的紧凑真空室，获得了使用该系统真的可以观察到半导体表面的证据。

Recently, surface and interface structures of advanced semiconductor devices should be controlled in an atomic scale, and the technique to investigate the real structures of the surfaces and interfaces is getting much important. In order to realize in-situ observation of the semiconductor device structures in conventional crystal growth system via X-ray diffraction and scattering measurements, a special X-ray diffractomator in which all the components, the X-ray source, the detector and the sample, were fixed was developed. A insident X-ray optics using two Johanson monochromator crystals were newly designed and developed to realize the in-situ observation with no motions. Using a compact vacuum chamber specially designed to use with the new optics, a evidence that semiconductor surfaces can really be observed using the system was obtained.