Preferential sputtering of polymer surface using Ar cluster ion beam

在这项研究中，我们测量了西姆斯光谱的有机薄膜和污染的衬底样品使用气体团簇离子弹丸，然后分析的数据，使用自建模曲线分辨率方法（SMCR）。结果表明，污染物和样品中的大量二次离子峰可分为3种或4种，主要为甲基丙烯酸、丙烯酸和硅烷偶联剂的成分。并在实验室完成了XPS装置的研制。在下一步中，我们将使用西姆斯和XPS研究GCIB溅射过程的机制。

In this study, we measured SIMS spectra of organic thin film and a contaminated substrate sample using gas cluster ion projectiles, and then analyzed the data using the self-modeling curve resolution method (SMCR). As a result, we could classify many secondary ion peaks into 3 or 4 species.As a result, the many secondary ion peaks from the contaminant and sample is classified into the components from methacrylic acid, that from acrylic acid and that from silane coupling agents. And alsowe have finished the development of the XPS apparatus in the lab. In the next step, we will study the mechanism of GCIB sputtering processes using the SIMS and XPS.