Elucidation of mechanism of photo-crystal growth in chemical solution deposition method based on nano second temperature measurement under pulsed UV laser irradiation

在准分子激光辅助金属有机物沉积（ELAMOD）技术中，脉冲紫外激光照射下的表面温度升高是氧化物薄膜低温制备的关键。为了定量地了解这种光热过程，我们开发了一种新的系统，利用近红外传感器，可以检测从照射表面的热发射信号。在发射信号历史中观察到的平台的利用使得能够将发射信号强度转换成温度。该方法可以定量分析ELAMOD工艺中光致晶体生长的光热过程，也可以作为准分子激光加工的监控工具，这将扩大ELAMOD工艺向柔性和可印刷电子产品的发展。

In the excimer laser-assisted metal organic deposition (ELAMOD), a surface temperature rise at a few tens of nanoseconds upon the irradiation of pulsed UV laser is the key to the low temperature fabrication process of oxide thin films. In order to understand this photo-thermal process quantitatively, we have developed a novel system utilizing near-infrared sensors that can detect thermal emission signals from the irradiated surfaces. Utilization of plateau, which was observed in the emission signal history, enables the conversion of emission signal intensities into temperatures. This method enables us quantitative analysis of photo-thermal process of photo crystal growth in the ELAMOD process, and is also useful as a monitoring tool for excimer laser processing, which will expand the ability of ELAMOD process into flexible and printable electronics.