Topological Engineering Translation Grant

作为基础技术项目拓扑工程的一部分，我们将利用超临界流体电沉积（SCFED）的独特特性，解决微机电（MEMs）加速度计、用于记录介质的磁性纳米线和等离子体光学超材料领域的重要技术问题。目前，我们是世界上唯一一个拥有超临界流体电沉积通用方法的团队。我们开发了SCFED，使器件质量的无机半导体（如Ge， Si和GaAs）在电气控制/反馈下沉积到纳米结构模板中。在这里，我们将把这项技术应用于沉积金属系统，因为这将使我们在不久的将来产生重大的技术影响。使用超临界流体（SCF）作为电沉积介质，为电沉积已经被广泛利用的优点增加了许多关键优点。这些优点包括零表面张力，低粘度，快速的质量传递，大的电化学窗口，以及沉积高活性材料的相关能力。在MEMs加速度计上提出的工作将产生具有世界领先灵敏度的器件，此外还证明了在独立的MEMs器件上电镀的能力，这些器件在润湿或干燥过程中会被表面张力破坏。磁性材料的研究工作主要集中在FePt、FeRh和SmCo的超高纵横比纳米线的沉积上。我们还将展示SCFED在生产具有超低损耗和超高光学非线性的纳米结构金属-介电负折射率材料中的适用性。这三个技术演示的结果将以一种方式传播，以最大限度地吸引科学界和工业界的材料科学家和技术专家的关注，并吸引工业界和相关政府组织（如TSB）的进一步资助。支持这项工作的翻译补助金将使我们能够通过开展一系列原理证明研究，迅速利用我们在这种新材料沉积技术方面的世界领先地位，这些研究不容易单独资助，并且相互关联将导致总和大于部分。它还将使我们能够确保三位主要研究人员的资金连续性，并为我们提供开发其他项目的灵活性，因为SCFED的重要优势在更广泛的材料界变得明显。

We will exploit the unique features of supercritical fluid electrodeposition (SCFED), which we pioneered as part of the Basic Technology program Topological Engineering , to solve important technological problems in the fields of microelectromechanical (MEMs) accelerometers, magnetic nanowires for recording media, and plasmonic optical metamaterials. We are currently the only group in the world with a generally applicable method for electrodeposition from a supercritical fluid. We developed SCFED to enable the deposition of device quality inorganic semiconductors such as Ge, Si and GaAs under electrical control/feedback and into nanostructured templates. Here, we will apply this technique to deposit metallic systems as this will allow us to make significant technological impact in the near future. Using a supercritical fluid (SCF) as the medium for electrodeposition adds a number of key advantages to the already widely exploited advantages of electrodeposition. These include zero surface tension, low viscosity, fast mass transport, a large electrochemical window, and the related ability to deposit highly reactive materials. The proposed work on MEMs accelerometers will produce a device with world leading sensitivity and in addition demonstrate the ability to electroplate onto free standing MEMs devices which would be destroyed by surface tension during wetting or drying. The proposed work on magnetic materials focuses on the deposition of ultrahigh aspect ratio nanowires of FePt, FeRh, and SmCo. We will also demonstrate the applicability of SCFED to the production of nanostructured metal-dielectric negative refractive index materials with ultralow loss and ultrahigh optical non-linearities. The results from these three technological demonstrators will be disseminated in a manner to attract maximum attention from materials scientists and technologists across science and industry and attract further funding from industry and associated government organisations, e.g. TSB. The award of a Translation Grant to support this work will enable us to rapidly exploit our world leading position in this new materials deposition technology by undertaking a series of proof of principle studies, which would not be easy to fund separately and where there inter-relatedness will lead to the sum being greater than the parts. It will also enable us to ensure continuity of funding for three key researchers together with providing us the flexibility to develop other projects as the important advantages of SCFED become apparent to the wider materials community.