FINESSE NanoBio (Fabrication and Imaging of Neon-Etched Structures and Surfaces for Engineering, Nanoscience and Biotechnology)

FINESSE NanoBio团队提出了一项新的英国能力，用于成像，横截面和图案材料，传统上很难在纳米和亚纳米尺度上进行检查，而不会严重影响其结构或行为。重要的是，英国处于这一研究的前沿，使初创企业、中小企业和大公司能够以更强的科学理解为基础，推动创新和增长。为了解决这个问题，该团队正在为定制的蔡司纳米实验室工具申请资金，该工具包括：导电和非导电样品的超高精度成像能力（低于0.5 nm） 2。具有相同范围样品的超高精度图像化和TEM样品制备能力（2 nm） 3。一种低温样品处理系统，用于对生物材料以及与材料和结构的生物或流体界面进行成像。该工具通过将氦离子流聚焦到表面并测量随后释放的二次电子来实现这一革命性的性能。离子也可以用来去除在其路径上的材料，用于图案化或横截面材料。该系统有三种离子选择，镓用于大量去除，氖用于额外抛光和切割，氦用于非常仔细的抛光。这种行为上的差异是由于离子的质量较低。用该系统直接写入10nm特征尺寸的金属也是可行的，这将使电触点能够制造成先进的功能材料，例如，在制造传感器时测试它们的导电性或电化学行为。所要求的支持将产生深远的影响，通过项目和工业合作伙伴的近50个研究小组积极支持该提案在剑桥，横跨10个不同的部门和4个不同的学院。来自5所大学、2个弹射机构和3个工业网络组织的大力支持，扩大了这一科学影响领域，这些组织代表了大约1500家公司。学术界和工业研究人员的这种令人难以置信的反应意味着该设施还将推动这些参与者之间的新参与和合作，并将通过计划中的研讨会和参与活动等方式促进合作。由经验丰富的研究人员和显微镜套件管理人员组成的小委员会将负责调试、访问、推广和管理，并由EPSRC、工业和学术合作伙伴组成的更大指导小组进行审查和指导，以确保公平访问，促进合作和研究生教育的环境。

The FINESSE NanoBio team is proposing a new UK capability in imaging, cross-sectioning and patterning materials that are traditionally very difficult to examine at the nano and sub-nanometre scale without seriously effecting their structure or behaviour. It is important that the UK is placed at the forefront of this research, enabling start-ups, SMEs and large companies to drive innovation and growth with stronger underpinning scientific understanding. To address this, the team is requesting funding for a customised Zeiss NanoFab tool that consists of:1. An ultra-high precision imaging capability (sub 0.5 nm) of conductive and non-conductive samples2. An ultra-high precision patterning and TEM sample preparation capability (2 nm) of the same range of samples3. A cryogenic sample handling system to enable imaging of biological materials and biological or fluid interfaces with materials and structures.The tool achieves this revolutionary performance by focusing a stream of helium ions onto the surface and measuring the subsequently released secondary electrons. Ions can also be used to remove material in their path for patterning or cross-sectioning materials. This system has three ion options, gallium for bulk removal, neon for additional polishing and cutting and helium for very careful polishing. This difference in behaviour is due to the lower mass of the ions.Direct writing of metals in 10nm feature sizes is also feasible with this system, which will enable electrical contacts to be fabricated to advanced functional materials to test, for example, their conductivity or electrochemical behaviour when making sensors.The requested support will have far-reaching impact through the projects and industrial partners of almost 50 research groups actively supporting this proposal in Cambridge, across 10 different Departments and 4 different Schools. This sphere of scientific influence is amplified by the strong support from 5 universities, 2 catapult organisations and 3 industrial network organisations, who represent an estimated 1500 companies.This incredible response by academics and industrial researchers means the facility will also drive new engagement and collaborations between these partiers and will foster collaboration, through for example the planned symposium and engagement events.The commissioning, access, outreach and management will be delivered by a small committee of experienced researchers and microscopy suite managers, with review and guidance from a larger steering group of EPSRC, industrial and academic partners to ensure fair access, an environment that fosters collaborations and postgraduate education.