Profilometer Urgently Needed to Measure Thickness of Films Made in the Applied Micro and Nanosystems Facility

应用微纳米系统设施（AMNF）是一个多学科和多用户的洁净室制造设施，支持UBC Okanagan教授在光子学，等离子体，芯片实验室系统，流体动力学和生物材料等领域的实验研究。 这种应用需要一个关键的AMNF设备-轮廓仪。 该轮廓仪将能够对0至1.2微米范围内的薄膜厚度进行高精度、鲁棒性、非原位测量。它被认为是洁净室制造设施中的标准设备，因为它通常用于验证制造薄膜的厚度和校准薄膜沉积速率。我们迫切需要这种设备，因为AMNF没有轮廓仪。 因此，AMNF中溅射沉积系统的用户在没有准确的膜厚知识或使用昂贵且缓慢的解决方法（如外包表征）的情况下制作膜。 通过此次升级，AMNF用户可以更有效地利用他们的时间和资源来探索制造设备的最终应用，从而提高HQP培训的质量。

The Applied Micro and Nanosystems Facility (AMNF) is a multi-disciplinary and multi-user clean-room fabrication facility that supports experimental research of UBC Okanagan professors working in areas such as photonics, plasmonics, lab-on-a-chip systems, fluid dynamics, and biomaterials. This application requests a critical piece of equipment for the AMNF - a profilometer. The profilometer will enable highly accurate, robust, ex-situ measurement of thin-film thicknesses ranging from 0 to 1.2 microns. It is considered to be a standard piece of equipment in clean-room fabrication facilities, as it is routinely used to verify the thickness of fabricated films and to calibrate film deposition rates. We are urgently requesting this equipment because the AMNF does not have a profilometer. As a result, users of the sputter deposition system in the AMNF are making films without accurate knowledge of film thickness or using costly and slow workarounds such as outsourced characterization. With this proposed upgrade, AMNF users can apply their time and resources more effectively to explore the end applications of fabricated devices, increasing the quality of HQP training.