Urgently Needed Reactive Sputtering Deposition System for Strategic Thin-Film Materials in Microsystems and to Replace a Non-Functional Evaporator

微系统中战略薄膜材料急需的反应溅射沉积系统并取代无功能的蒸发器

• 批准号: 472787-2015
• 负责人: Nabki, Frederic
• 金额: $ 10.91万
• 依托单位: Université du Québec à Montréal
• 依托单位国家: 加拿大
• 项目类别: Research Tools and Instruments - Category 1 (<$150,000)
• 财政年份: 2014
• 资助国家: 加拿大
• 起止时间: 2014-01-01 至 2015-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=564843
• 关键词: Urgently; Needed; Reactive; Sputtering; Deposition

The goal of this proposal is to acquire a reactive sputtering system (RSS) to replace an old evaporator which is not functional and to enhance our thin-film deposition capabilities. This RSS will restore our ability to deposit metallic thin-films that are critical to our research activities and will open the door to the deposition of other strategic materials for the fabrication of novel microsystems with applications in integrated microwave devices, microelectromechanical systems, integrated photonics, microbatteries, and organic optoelectronics.

这项提议的目标是获得一个反应溅射系统(RSS)，以取代不起作用的旧蒸发器，并增强我们的薄膜沉积能力。该RSS将恢复我们沉积对我们的研究活动至关重要的金属薄膜的能力，并将打开沉积其他战略材料的大门，用于制造应用于集成微波器件、微机电系统、集成光子学、微电池和有机光电子的新型微系统。