Enhanced photoelectrochemical water oxidation performance by altering the interfacial charge transfer path
Enhanced photoelectrochemical water oxidation performance by altering the interfacial charge transfer path
复制标题
通过改变界面电荷转移路径增强光电化学水氧化性能
DOI：
10.1039/c7qi00211d
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发表时间：
2017-08
影响因子：
7
通讯作者：
Xie Tengfeng
中科院分区：
文献类型：
--
作者：
Xu D;an;Bu Qijing;Wang Dejun;Xie Tengfeng
本文广泛采用助催化剂来提高光催化水氧化性能。在助催化剂/半导体体系中，半导体与助催化剂之间的电荷转移是决定光电化学（PEC）水氧化性能的关键过程；然而，表面状态对电荷转移的影响很少被讨论。在本研究中，将Al2O3插入到CoPi/Ti-Fe2O3界面中，制备了CoPi/Al2O3/Ti-Fe2O3光阳极。CoPi/Al2O3/Ti-Fe2O3对光电流密度有显著的改善。结合UV-vis漫反射光谱（DRS）、表面光电压光谱（SPS）、斩波光电流以及不同斩波光频率下的光电流，研究了Al2O3在电荷转移过程中的真实作用。发现Al2O3钝化了ti掺杂Fe2O3的表面态，使得ti掺杂Fe2O3与CoPi之间的界面电荷转移更好，从而提高了PEC的水氧化性能。
Herein, a cocatalyst was extensively used to enhance the photocatalytic water oxidation performance. In a cocatalyst/semiconductor system, charge transfer between a semiconductor and cocatalyst is a crucial process for the photoelectrochemical (PEC) water oxidation performance; however, the influence of surface states on charge transfer has rarely been discussed. In this study, Al2O3 was inserted into the CoPi/Ti-Fe2O3 interface to fabricate a CoPi/Al2O3/Ti-Fe2O3 photoanode. CoPi/Al2O3/Ti-Fe2O3 showed a notable improvement in the photocurrent density. A combination of UV–vis diffuse reflectance spectroscopy (DRS), surface photovoltage spectroscopy (SPS), chopped light photocurrent, and photocurrents under different chopped light frequencies was used to study the real role of Al2O3 in the charge transfer process. It was found that Al2O3 passivated the surface states of Ti-doped Fe2O3, leading to a better interfacial charge transfer between Ti-doped Fe2O3 and CoPi, resulting in the enhanced PEC water oxidation performance.
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影响因子：
6.7
作者：
Gongming Wang;Yichuan Ling;Xihong Lu;Teng Zhai;Fang Qian;Y. Tong;Yat Li
通讯作者：
Gongming Wang;Yichuan Ling;Xihong Lu;Teng Zhai;Fang Qian;Y. Tong;Yat Li
DOI：
10.1021/j100334a034
发表时间：
1988-11
期刊：
The Journal of Physical Chemistry
影响因子：
--
作者：
J. Leduc;S. M. Ahmed
通讯作者：
J. Leduc;S. M. Ahmed
影响因子：
17.1
作者：
Riha, Shannon C.;Klahr, Benjamin M.;Martinson, Alex B. F.
通讯作者：
Martinson, Alex B. F.
影响因子：
41.2
作者：
Lin, Fuding;Boettcher, Shannon W.
通讯作者：
Boettcher, Shannon W.
影响因子：
--
作者：
Tae-Youl Yang;Ho‐Young Kang;K. Jin;Sangbaek Park;Jihoon Lee;U. Sim;Hui-Yun Jeong;Young‐Chang Joo;K. Nam
通讯作者：
Tae-Youl Yang;Ho‐Young Kang;K. Jin;Sangbaek Park;Jihoon Lee;U. Sim;Hui-Yun Jeong;Young‐Chang Joo;K. Nam