Elimination of X-rays irradiated defects in fused silica by laser conditioning
Elimination of X-rays irradiated defects in fused silica by laser conditioning
复制标题
通过激光调理消除熔融石英中的 X 射线辐照缺陷
DOI：
10.1016/j.optcom.2020.126639
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发表时间：
2021-03
影响因子：
2.4
通讯作者：
Li Yaguo
中科院分区：
文献类型：
--
作者：
Zhang Jian;Geng Feng;Zhichao Liu;Tao Xu;Qinghua Zhang;Qiao Xu;Li Yaguo
摘要熔融二氧化硅作为辐射环境中的光学元件已得到广泛应用。在这些应用中，一些光学元件经常暴露在X射线和其他电离辐射下，导致光吸收增加，激光损伤阈值降低，从而破坏了它们的光学性能和使用寿命。由于一些光学元件很难实现在线加热来消除辐射缺陷，而离线加热会影响这些系统的正常运行，因此，我们提出采用激光调质来消除辐射缺陷。通过光吸收测量和激光损伤阈值测试，验证了该技术的优越性。实验结果表明，无论X射线照射时间是1h还是5h，激光处理都能有效地降低X射线照射区域在200~320 nm范围内的光谱吸收，恢复激光损伤阈值。结果表明，激光调理技术是一种潜在的消除X射线诱导缺陷的有用工具，适合于高功率激光系统的在线处理。
Abstract Fused silica has been widely used as optical components in radiation environment. Some optical components used in these applications are frequently exposed to X-rays and other ionizing radiation, leading to the increase of optical absorption and decrease of laser-induced damage threshold, thus undermining their optical properties and operational lifetime. As on-line heating is difficult to achieve for some optical components to eliminate radiation induced defects; on the other hand off-line heating will affect the normal operation of these systems, therefore, we proposed to employ laser conditioning to eliminate radiation induced defects. The advantages of the proposed technique are demonstrated via optical absorption measurement and laser-induced damage threshold test. The experimental results show that laser conditioning can effectively reduce spectral absorption in the range from 200nm to 320nm in the X-rays irradiated areas and recover laser-induced damage threshold, regardless of X-rays irradiation time, 1h or 5h. It appears that the laser conditioning technology is potentially a useful tool to eliminate X-rays induced defects, and suited for on-line treatment in high-power laser systems.
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影响因子：
3.5
作者：
Xiaocong Peng;Yuanan Zhao;Yueliang Wang;Guohang Hu;L. Yang;J. Shao
通讯作者：
Xiaocong Peng;Yuanan Zhao;Yueliang Wang;Guohang Hu;L. Yang;J. Shao
影响因子：
3.9
作者：
Yingshuang Song;Chonghong Zhang;Yi-tao Yang;J. Gou;Liqing Zhang;D. He
通讯作者：
Yingshuang Song;Chonghong Zhang;Yi-tao Yang;J. Gou;Liqing Zhang;D. He
影响因子：
3.1
作者：
Leon, M.;Martin, P.;Hodgson, E. R.
通讯作者：
Hodgson, E. R.
影响因子：
8.6
作者：
H. Hosono;H. Kawazoe;N. Matsunami
通讯作者：
H. Hosono;H. Kawazoe;N. Matsunami
DOI：
10.1016/j.nimb.2014.03.011
发表时间：
2014-07-01
影响因子：
1.3
作者：
Fu, Xinjie;Song, Lixin;Li, Jiacheng
通讯作者：
Li, Jiacheng